Results 1 to 10 of about 29,849 (211)
Atomic Layer Deposition (ALD) of Metal Gates for CMOS [PDF]
Applied Sciences, 2019 The continuous down-scaling of complementary metal oxide semiconductor (CMOS) field effect transistors (FETs) had been suffering two fateful technical issues, one relative to the thinning of gate dielectric and the other to the aggressive shortening of ...
Chao Zhao, Jinjuan Xiang
doaj +2 more sources
Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects
Nanomaterials, 2022 The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj +1 more source
Investigations of CrN/TiO2 coatings obtained in a hybrid PVD/ALD method on Al-Si-Cu alloy substrate [PDF]
Bulletin of the Polish Academy of Sciences: Technical Sciences, 2023 The paper addresses an important scientific topic from the utilitarian point of view concerning the surface treatment of Al-Si-Cu aluminum alloys by PVD/ALD hybrid coating deposition. The influence of the conditions of deposition of titanium oxide in CrN/
Marcin Staszuk
doaj +1 more source
Material manufacturing from atomic layer
International Journal of Extreme Manufacturing, 2023 Atomic scale engineering of materials and interfaces has become increasingly important in material manufacturing. Atomic layer deposition (ALD) is a technology that can offer many unique properties to achieve atomic-scale material manufacturing ...
Xinwei Wang, Rong Chen, Shuhui Sun
doaj +1 more source
Nanomaterials, 2022 In this paper, we present a study on thermal conductivity and viscosity of nanofluids containing novel atomic layer deposition surface-modified carbon nanosphere (ALD-CNS) and carbon nanopowder (ALD-CNP) core-shell nanocomposites. The nanocomposites were
Marcell Bohus +8 more
doaj +1 more source
Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Nanomaterials, 2022 Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer ...
Javier Garcia Fernández +2 more
doaj +1 more source
Epitaxy from a Periodic Y–O Monolayer: Growth of Single-Crystal Hexagonal YAlO3 Perovskite
Nanomaterials, 2020 The role of an atomic-layer thick periodic Y–O array in inducing the epitaxial growth of single-crystal hexagonal YAlO3 perovskite (H-YAP) films was studied using high-angle annular dark-field and annular bright-field scanning transmission electron ...
Minghwei Hong +7 more
doaj +1 more source
Journal of Information Display, 2023 Area-selective atomic layer deposition (AS-ALD) has been studied as an alternative method for metal oxide ALD film patterning in the microelectronics industry. To perform AS-ALD, area-deactivation or -activation processes should be implemented in advance
Jun Ho Yu +4 more
doaj +1 more source
Proceedings, 2019 Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Engin Ciftyurek +5 more
doaj +1 more source
Nanomaterials, 2020 ZnO is a remarkable material with many applications in electronics and catalysis. Atomic layer deposition (ALD) of ZnO on flat substrates is an industrially applied and well-known process.
Piyush Ingale +5 more
doaj +1 more source