Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting [PDF]
, 2019 The development of active and stable earth-abundant catalysts for hydrogen and oxygen evolution is one of the requirements for successful production of solar fuels.
Dendooven, Jolien +7 more
core +2 more sources
GaAs interfacial self-cleaning by atomic layer deposition [PDF]
, 2008 The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied using in situ monochromatic x-ray photoelectron spectroscopy.
A. M. Sonnet +12 more
core +1 more source
Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [PDF]
, 2016 We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray ...
Alessandro Coati +10 more
core +2 more sources
Atomic layer deposition to heterostructures for application in gas sensors
International Journal of Extreme Manufacturing, 2023 Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan +5 more
doaj +1 more source
Nanoscale Au-ZnO heterostructure developed by atomic layer deposition towards amperometric H2O2 detection [PDF]
, 2020 Nanoscale Au-ZnO heterostructures were fabricated on 4-in. SiO2/Si wafers by the atomic layer deposition (ALD) technique. Developed Au-ZnO heterostructures after post-deposition annealing at 250 degrees C were tested for amperometric hydrogen peroxide ...
Hu, Jie +4 more
core +2 more sources
Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation
Applied Sciences, 2022 This study focused on the atomic scale growth dynamics of amorphous Al2O3 films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has
Thokozane Justin Kunene +5 more
doaj +1 more source
Atomic layer deposition of thin films: from a chemistry perspective
International Journal of Extreme Manufacturing, 2023 Atomic layer deposition (ALD) has become an indispensable thin-film technology in the contemporary microelectronics industry. The unique self-limited layer-by-layer growth feature of ALD has outstood this technology to deposit highly uniform conformal ...
Jinxiong Li, Gaoda Chai, Xinwei Wang
doaj +1 more source
Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films [PDF]
, 2009 This paper provides a prospective insight on chemical vapour deposition (CVD) and atomic layer deposition (ALD) as dry techniques for the processing of amorphous and nanocrystalline metallic thin films.
Blanquet, Elisabeth +3 more
core +5 more sources
Improved Monolayer MoS Performance With Two-Step Atomic Layer Deposited High- Dielectrics
IEEE Journal of the Electron Devices Society, 2022 Gate dielectric engineering is crucial to enable two-dimensional (2D) transition metal dichalcogenides (TMDs) for logic transistor applications. In this work, we demonstrate a uniform and pinhole-free bilayer high-κ fabricated on monolayer (1L ...
Bo-Jhih Chou +3 more
doaj +1 more source
Area‐selective atomic layer deposition on HOPG enabled by writable electron beam functionalization
Nano Select, 2022 Area‐selective atomic layer deposition (AS‐ALD) techniques are an emerging class of bottom‐up nanofabrication techniques that selectively deposit patterned ALD films without the need for conventional top‐down lithography. To achieve this patterning, most
Gordon Koerner +5 more
doaj +1 more source