Results 21 to 30 of about 29,849 (211)
Molecules, 2023 Hydroxyapatite (HA; Ca10(PO4)6(OH)2) coating of bone implants has many beneficial properties as it improves osseointegration and eventually becomes degraded and replaced with new bone. We prepared HA coating on a titanium substrate with atomic layer deposition (ALD) and compared monocyte differentiation and material resorption between ALD-HA and bone ...
Elina Kylmäoja +4 more
openaire +5 more sources
AIP Advances, 2014 Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect.
W. S. Lau +5 more
doaj +1 more source
Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Electrochemistry Communications, 2019 Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER).
V. Di Palma +6 more
doaj +1 more source
Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine [PDF]
, 2014 We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine.
Dey, Gangotri, Elliott, Simon D.
core +1 more source
Atomic layer deposition (ALD) on inorganic or polymeric membranes [PDF]
Journal of Applied Physics, 2019 Membranes can be defined as physical barriers allowing the selective transport of species. This tutorial aims to provide the basics of membrane technologies and materials, the fundamentals of the atomic layer deposition (ALD) technique, and, most importantly, to describe how to efficiently perform ALD on different membrane substrates.
Matthieu Weber +3 more
openaire +1 more source
Design and characterisation of titanium nitride sub-arrays of kinetic inductance detectors for passive terahertz imaging [PDF]
, 2018 We report on the investigation of titanium nitride (TiN) thin films deposited via atomic layer deposition (ALD) for microwave kinetic inductance detectors (MKID).
Banerjee, Archan +7 more
core +3 more sources
Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor [PDF]
, 2013 Two novel N-heterocyclic carbene (NHC)-containing copper(I) amides are reported as atomic layer deposition (ALD) precursors. 1,3-Diisopropyl-imidazolin-2-ylidene copper hexamethyldisilazide (1) and 4,5-dimethyl-1,3-diisopropyl-imidazol-2-ylidene copper ...
Barry, Seán T. +8 more
core +1 more source
(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films [PDF]
, 2015 Conventional atomic layer deposition (ALD) is a thermo-chemical process where co-reagents are sequentially pulsed in cycles onto a heated substrate. As an alternative to substrate heating, various forms of other “non-thermal” ALD processes are being ...
Brunell, Ian F +7 more
core +1 more source
Beilstein Journal of Nanotechnology, 2013 We report on results on the preparation of thin (
Jörg Haeberle +7 more
doaj +1 more source
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Nanomaterials, 2021 With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry.
Guibai Xie +7 more
doaj +1 more source