Results 251 to 260 of about 2,309,761 (293)
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Scaling of atomic layer etching of SiO2 in fluorocarbon plasmas: Transient etching and surface roughness

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2021
Mark Kushner, Xifeng Wang
exaly  

Plasma enhanced atomic layer etching of high-k layers on WS2 Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2022
Jean-François de Marneffe   +2 more
exaly  

Atomic Layer Etching - Breaking Through the Limitation of Etch

Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials, 2018
K. Nojiri   +4 more
openaire   +1 more source

Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2021
Kazunori Shinoda, Nobuya Miyoshi
exaly  

Overview of atomic layer etching in the semiconductor industry Open Access

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2015
Keren J Kanarik   +2 more
exaly  

Plasma atomic layer etching using conventional plasma equipment Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2009
Mark Kushner
exaly  

Comparative study of two atomic layer etching processes for GaN

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2020
Christophe Durand   +2 more
exaly  

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2014
Dominik Metzler   +2 more
exaly  

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