Carrier Mapping in Sub-2nm Node Nanosheet Transistors with Scanning Spreading Resistance Microscopy. [PDF]
Within this work, advancements in scanning spreading resistance microscopy (SSRM) allow charge carrier mapping within 5.5 nm‐thick nanosheet channels. Devices subjected to rapid thermal annealing at 950°C show ∼ 5 nm enhanced phosphorus diffusion, with profiles in close agreement with semi‐atomistic process simulations.
Pondini A +7 more
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Remarkably High Effective Mobility of 301 cm2/V·s in 3 nm Ultra-Thin-Body SnO2 Transistor by UV Annealing. [PDF]
Shih AC, Zhan YH, Chin A.
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Comprehensive Review of FinFET Technology: History, Structure, Challenges, Innovations, and Emerging Sensing Applications. [PDF]
Karimi K, Fardoost A, Javanmard M.
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Effect of C<sub>2</sub>H<sub>2</sub>F<sub>4</sub>/CF<sub>4</sub>O with low global warming potentials on SiN<sub>x</sub> etching as a CHF<sub>3</sub> replacement. [PDF]
Kim KL +11 more
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Epitaxial Mixed-Dimensional MoS<sub>2</sub> Nanofin-Nanoribbon Hybrids and Their Integration into Electronic and Optoelectronic Devices. [PDF]
Danieli Y +7 more
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An Overview of Hot Carrier Degradation on Gate-All-Around Nanosheet Transistors. [PDF]
Zhou H.
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Sub-THz communication systems: pushing the capabilities of silicon. [PDF]
Gruber J +6 more
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Design and analysis of high-k wrapped underlap induced GaN multi-channel GAA nanosheet FET for enhanced performance with cut-off frequency in THz range. [PDF]
Singh S, Dhar RS, Banerjee A, Gupta V.
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Highly Selective Isotropic Etching of Si to SiGe Using CF<sub>4</sub>/O<sub>2</sub>/N<sub>2</sub> Plasma for Advanced GAA Nanosheet Transistor. [PDF]
Li J, Sun X, Huang Z, Zhang DW.
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Degradation Induced by Total Ionizing Dose and Hot Carrier Injection in SOI FinFET Devices. [PDF]
Yu H +5 more
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