Results 31 to 40 of about 562 (143)

Influence of the Gate Height Engineering on the Intrinsic Parameters of UDG-MOSFETs With Nonquasi Static Effect

open access: yesIEEE Journal of the Electron Devices Society, 2015
This paper presents the results of a systematic theoretical investigation on the impact of gate height on the analog and radio-frequency (RF) performances of underlap-FinFET devices.
Sayani Ghosh   +3 more
doaj   +1 more source

Review on suitable eDRAM configurations for next nano-metric electronics era [PDF]

open access: yes, 2018
We summarize most of our studies focused on the main reliability issues that can threat the gain-cells eDRAM behavior when it is simulated at the nano-metric device range has been collected in this review. So, to outperform their memory cell counterparts,
Amat, Esteve   +3 more
core   +3 more sources

Silicon-Based Micromachining Process for Flexible Electronics [PDF]

open access: yes, 2019
In this chapter, we introduce silicon-based micromachining process and devices for flexible electronics application. Silicon-based flexible electronics have the unique advantage over other polymer-based process that leverage the traditional standard CMOS
Wu, Tao, Yang, Jiye
core   +2 more sources

Benchmarking the screen-grid field effect transistor (SGrFET) for digital applications

open access: yes, 2010
Continuous scaling of CMOS technology has now reached a state of evolution, therefore, novel device structures and new materials have been proposed for this purpose.
Shadrokh, Yasaman, Shadrokh, Yasaman
core   +1 more source

Performance assessment of InGaAs–SOI–FinFET for enhancing switching capability using high-k dielectric

open access: yesMemories - Materials, Devices, Circuits and Systems
In this work, a high-k In0.53Ga0.47As silicon-on-insulator FinFET (InGaAs–SOI–FinFET) is presented for high-switching and ultra-low power applications at 7 nm gate length.
Priyanka Agrwal, Ajay Kumar
doaj   +1 more source

High-k dielectrics on (100) and (110) n-InAs: Physical and electrical characterizations

open access: yesAIP Advances, 2014
Two high-k dielectric materials (Al2O3 and HfO2) were deposited on n-type (100) and (110) InAs surface orientations to investigate physical properties of the oxide/semiconductor interfaces and the interface trap density (Dit).
C. H. Wang   +18 more
doaj   +1 more source

Out-of-Equilibrium Carrier Dynamics in Graphene and Graphene-based Devices for High-Performance Electronics [PDF]

open access: yes, 2019
[ES]Con los límites tecnológicos de las tecnologías de semiconductores tradicionales alcanzando los límites de escalado y integración en chip, el descubrimiento del grafeno y sus impresionantes propiedades supuso una prometedora alternativa para el ...
Iglesias Pérez, José Manuel
core   +2 more sources

Silicon- and Graphene-based FETs for THz technology [PDF]

open access: yes, 2019
[EN] This Thesis focuses on the study of the response to Terahertz (THz) electromagnetic radiation of different silicon substrate-compatible FETs. Strained-Si MODFETs, state-of- the-art FinFETs and graphene-FETs were studied.
Delgado Notario, Juan Antonio
core   +2 more sources

Dielectric and Gate Metal Engineering for Threshold Voltage Modulation in Enhancement Mode Monolayer MoS2 Field Effect Transistors

open access: yesAdvanced Materials, EarlyView.
Enhancement‐mode monolayer MoS2 FETs with low threshold voltage are essential for low‐power electronics. The threshold voltage can be tuned by the gate metal work function when the semiconductor/dielectric interface is clean. Interfaces between monolayer MoS2 and ZrO2 or hBN allow effective work‐function modulation of the threshold voltage, in contrast
Lixin Liu   +10 more
wiley   +1 more source

High Performance Electronics on Flexible Silicon [PDF]

open access: yes, 2016
Over the last few years, flexible electronic systems have gained increased attention from researchers around the world because of their potential to create new applications such as flexible displays, flexible energy harvesters, artificial skin, and ...
Sevilla, Galo T.
core   +1 more source

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