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Contribution of ultrasonic traveling wave to chemical–mechanical polishing
Ultrasonics, 2015Liang Li
exaly
Chemical and mechanical balance in polishing of electronic materials for defect-free surfaces
CIRP Annals - Manufacturing Technology, 2009Hyunseop Lee, H D Jeong
exaly
Polishing Characteristics of Hydrophilic Pad in Chemical Mechanical Polishing Process
Materials and Manufacturing Processes, 2012Ming-Yi Tsai
exaly
Characterization of Cu chemical mechanical polishing by electrochemical investigations
Microelectronic Engineering, 1997D Zeidler, M Plötner, K Drescher
exaly
Chemical mechanical polishing of steel substrate using colloidal silica-based slurries
Applied Surface Science, 2015Liang Jiang, Jianbin Luo
exaly
Chemical mechanical polishing of integrated circuits
1994van Kranenburg, H. +3 more
openaire +2 more sources
Simulation Model of Polishing Pressure in Chemical-Mechanical Polishing
The Proceedings of The Computational Mechanics Conference, 2018Yuki NAKANO +6 more
openaire +1 more source

