Results 221 to 230 of about 18,989 (261)

Mechanical interactions and their effects on chemical mechanical polishing

IEEE Transactions on Semiconductor Manufacturing, 2001
Mechanical interactions, such as contact stress and fluid pressure are of extreme importance in silicon wafer polishing, especially for the wafer-scale planarity of the finished surfaces. In this paper, the measurements of interfacial fluid pressure and friction, as well as their dependence on some major process variables, are presented.
null Lei Shan, null Chunhong Zhou, S. Danyluk   +2 more
openaire   +1 more source

Silicon Nitride Chemical Mechanical Polishing Mechanisms

Journal of The Electrochemical Society, 1998
To elucidate the fundamentals of chemical mechanical polishing (CMP) of silicon nitride, low pressure chemical vapor deposited silicon nitride is analyzed by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy both before and after CMP, demonstrating the salient increase of oxygen content, amine species, and silanol groups ...
Y. Z. Hu, R. J. Gutmann, T. P. Chow
openaire   +1 more source

Polishing of polycrystalline diamond using synergies between chemical and mechanical inputs: A review of mechanisms and processes

Carbon, 2022
Chen Xiao, Feng-Chun Hsia, Bart Weber
exaly  

Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer

Tribology International, 2023
Jiahui Li, Chen Xiao, Shibo Zhang
exaly  

Tribological behavior of 6H–SiC wafers in different chemical mechanical polishing slurries

Wear, 2021
Qixiang Zhang, Jisheng Pan, Jiabin Lu
exaly  

Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect

Applied Surface Science, 2022
Wantang Wang, Baoguo Zhang, Yunhui Shi   +2 more
exaly  

Study on chemical mechanical polishing of silicon wafer with megasonic vibration assisted

Ultrasonics, 2017
Ke Zhai, Liang Li
exaly  

Chemical-Mechanical Polish and Electrochemical-Mechanical Polishing

2013
openaire   +1 more source

Chemical Mechanical Polishing of Ta

Electrochemical and Solid-State Letters, 1999
openaire   +1 more source

Chemical mechanical polishing of titanium

Abstracts of the General Sessions of the Japanese Society for Dental Materials and Devices, 2002
Okawa, S., Nakano, S., Watanabe, K., Kanatani, M., Hossain, Awlad, Miyakawa, O., Kobayashi, M.   +6 more
openaire   +1 more source