Results 31 to 40 of about 18,025 (163)

Using Acoustic Emissions for an in-situ evaluation of the polishing process and its parameters [PDF]

open access: yesEPJ Web of Conferences
Mechanical chemical glass polishing is a complex process with mechanical and chemical interactions. While we have used Acoustic Emissions (AEs) already for basic measurements, we have researched the process and its parameters e.g., the density of the ...
Benisch Michael   +2 more
doaj   +1 more source

Study on the effect of dynamic chemical polishing treatment on porous titanium alloy scaffolds fabricated using laser powder bed fusion

open access: yesMaterials & Design
This study addresses the issue of a significant amount of unmelted powder adhering to the surface of Laser Powder Bed Fusion (LPBF) porous titanium alloy scaffolds, and the current inability of existing technologies to effectively handle such surface ...
Jinwang Hu   +6 more
doaj   +1 more source

Two material removal modes in chemical mechanical polishing: mechanical plowing vs. chemical bonding

open access: yesFriction, 2023
With the rapid development of semiconductors, the number of materials needed to be polished sharply increases. The material properties vary significantly, posing challenges to chemical mechanical polishing (CMP).
Yuan Wu   +5 more
doaj   +1 more source

Modern scientific and practical approaches to the production of substrates from semiconductor compounds А3В5. Review

open access: yesКонденсированные среды и межфазные границы
Modern electronic and optical engineering uses А3В5 single-crystal semiconductor materials (GaAs, GaSb, InAs, InSb, and InP) as substrates for epitaxial growth. These materials are obtained in the form of massive single-crystal ingots.
Elena N. Abramova   +4 more
doaj   +1 more source

Features of manufacturing Cd1–xZnxTe ionizing radiation detector [PDF]

open access: yesTekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2013
The article describes a newly-developed method of manufacturing of an operating element of the Cd1–xZnxTe-detector of ionizing radiation with high sensitivity to low-energy gamma radiation of the americium 241Am radioactive isotope. The proposed two-step
Tomashik Z. F.   +10 more
doaj   +2 more sources

Semiconductor Physics, Quantum Electronics & Optoelectronics, 20 (1), P. 091-095 (2017). DOI: https://doi.org/10.15407/spqeo20.01.091 The influence of ethylene glycol on the chemical interaction of PbTe and Pb1–xSnxTe crystals with H2O2–HBr–ethylene glycol etching compositions

open access: yesSemiconductor Physics, Quantum Electronics & Optoelectronics, 2017
The process of cutting, mechanical and chemical treatment of the PbTe and Pb1–xSnxTe crystal surface has been studied. The dependences of the chemical-mechanical polishing rate versus dilution of the base polishing etchant H2O2–HBr–ethylene glycol by the
G.P. Malanych   +2 more
doaj  

Dry mechanical-electrochemical polishing of selective laser melted 316L stainless steel

open access: yesMaterials & Design, 2020
This paper aims to improve the surface quality of 316L stainless steel parts manufactured by selective laser melting (SLM) using dry mechanical-electrochemical polishing (DMECP).
Yuchao Bai   +6 more
doaj   +1 more source

Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass

open access: yesJournal of Materials Research and Technology
Fused silica glass, known for its exceptional physical and chemical properties, is widely used across diverse industries. Cerium oxide (CeO2), a common polishing abrasive, is extensively employed in polishing fused silica surfaces.
Xiaolong Ke   +10 more
doaj   +1 more source

Chromatic stability of acrylic resins of artificial eyes submitted to accelerated aging and polishing

open access: yesJournal of Applied Oral Science, 2010
Esthetics and durability of materials used to fabricate artificial eyes has been an important issue since artificial eyes are essential to restore esthetics and function, protect the remaining tissues and help with patients' psychological therapy ...
Marcelo Coelho Goiato   +4 more
doaj   +1 more source

Glimpse into reports on abrasive machining (Group G) during CIRP 2024 General Assembly

open access: yesJin'gangshi yu moliao moju gongcheng
To promote the international cutting-edge technical exchange in the field of abrasives, the Group G (abrasive processing) papers in the 2024 CIRP Annals – Manufacturing Technology journal have been specially selected for introduction. A total of 9 papers
Jiang GUO, Rongyan SUN, Zili ZHANG
doaj   +1 more source

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