Results 41 to 50 of about 18,025 (163)

Research Progress on Surface Polishing Technology of Powder Bed Fusion Titanium Alloy [PDF]

Cailiao Baohu
Powder bed fusion titanium alloys， as an important metallic material， are widely used in aerospace， medical devices and automotive industries.However， due to their unique material properties and processing methods， surface quality and performance ...
ZHOU Di, WU Songquan, LI Ziyang, LIU Lei, YANG Yi, WANG Hao, HUANG Aijun
doaj   +1 more source

Study chemical reaction of –Si–OH surface layer by solid and ionic form to surface quality when polishing with chemical–mechanical slurry

Journal of King Saud University: Engineering Sciences
The yttrium aluminium garnet (YAG) and sapphire materials are commonly used in laser and optical devices. Producing an ultra-precise surface quality is necessary for the application in optical devices.
Le Anh Duc, Pham Minh Hieu, Nguyen Minh Quang   +2 more
doaj   +1 more source

High-efficiency planarization method combining mechanical polishing and atmospheric-pressure plasma etching for hard-to-machine semiconductor substrates

Mechanical Engineering Journal, 2016
A high-efficiency planarization technique for preprocessing before final polishing is needed for hard-to-machine wide-band-gap semiconductors, such as silicon carbide (SiC), gallium nitride, and diamond.
Yasuhisa SANO, Kousuke SHIOZAWA, Toshiro DOI, Syuhei KUROKAWA, Hideo AIDA, Tadakazu MIYASHITA, Kazuto YAMAUCHI   +6 more
doaj   +1 more source

Chemical Mechanical Polishing for Oxygen Free Copper with Manganese Oxide Abrasives

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2008
The purpose of this study is to make clear the polishing characteristics of the manganese oxide slurry for wire material of Cu. To examine the polishing characteristics of the manganese oxide slurry, a series of polishing experiments for oxygen free ...
Ryunosuke SATO, Yoshio ICHIDA, Yoshitaka MORIMOTO, Kenji SHIMIZU   +3 more
doaj   +1 more source

Interfacial Forces in Chemical-Mechanical Polishing [PDF]

, 2009
It has been known that there are many types of forces involved in tribological systems. During chemical-mechanical polishing (CMP), those forces appear to be synergetic and unpredictable. We have recently investigated the forces, such as van der Walls, electrostatic, fluid drag, and friction using experimental approach combined with theoretical ...
Dedy Ng, Hong Liang
openaire   +1 more source

Technology for preparation of thermal elements of SbBiTe alloys for thermoelectric coolers

Moldavian Journal of the Physical Sciences, 2005
An improved technology for treatment of thermal elements of SbBiTe alloys is given. Optimal technological regimes for their cutting, mechanical and chemical polishing are found.
Meglei, Dragoş, Rusu, Anton, Canţer, Valeriu, Dîntu, Maria   +3 more
doaj  

Combined Ultrasonic Elliptical Vibration and Chemical Mechanical Polishing of Monocrystalline Silicon

MATEC Web of Conferences, 2016
An ultrasonic elliptical vibration assisted chemical mechanical polishing(UEV-CMP) is employed to achieve high material removal rate and high surface quality in the finishing of hard and brittle materials such as monocrystalline silicon, which combines ...
Liu Defu, Chen Tao, Yan Riming
doaj   +1 more source

Singularities of Polishing Substrates GaAs by Chemo-Dynamical and Non-Contact Chemo-Mechanical Methods

Фізика і хімія твердого тіла, 2016
The comparative investigation of two chemical polishing methods as applied to GaAs substrates is carried out. In both cases the equal etchant Br2+HBr was used. The comparison of etching rates and of surface morphology is carried out.
G. A. Pashchenko, M. J. Kravetsky, O. V. Fomin   +2 more
doaj   +1 more source

Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide

Micromachines
Magnetorheological–chemical-polishing tests are carried out on single-crystal silicon carbide (SiC) to study the influence of the process parameters on the polishing effect, predict the polishing results via a back propagation (BP) neural network, and ...
Huazhuo Liang, Wenjie Chen, Youzhi Fu, Wenjie Zhou, Ling Mo, Yue Jian, Qi Wen, Dawei Liu, Junfeng He   +8 more
doaj   +1 more source

Multi-physical field coupling polishing of diamond for atomic-scale damage-free surface

International Journal of Extreme Manufacturing
Diamond is renowned for its high stability in extreme environments, such as high temperatures, high pressures, and strong corrosive conditions, which makes it demonstrate irreplaceable superior performance in quantum devices, high-power optical systems ...
Song Yuan, Chi Fai Cheung, Fengzhou Fang, Han Huang, Chunjin Wang   +4 more
doaj   +1 more source