Results 241 to 250 of about 7,747 (289)

Radiative Cooling with Transparent Microstructured Hybrid Organic-Inorganic Polymer Film Fabricated by Nanoimprint Lithography. [PDF]

ACS Appl Mater Interfaces
Dimogerontaki N, Matthaiakakis N, Kehagias N.   +2 more
europepmc   +1 more source

Compound Meta-Optics for Advanced Optical Engineering. [PDF]

Sensors (Basel)
Lee HR, Kim D, Kim SJ.
europepmc   +1 more source

SERS and SEF with enhancement in nanogaps: from fabrication to biosensing. [PDF]

Nanoscale Adv
Sultangaziyev A, Aliyev D, Seitkali A, Bukasov R.   +3 more
europepmc   +1 more source

Design, fabrication, and optical imaging performance comparison of precision microlens arrays for application in plenoptic microscopy systems. [PDF]

Sci Rep
Kim C, Lee M.
europepmc   +1 more source

Molecular nonchemically amplified resists based on spirobixanthene backbone: Sulfoxime oxime esters versus sulfonium salts. [PDF]

Smart Mol
Yan Y, Zhao C, Hui J, Zhang X, Zhang X, Chen P, Peng X, Xiao Y.   +7 more
europepmc   +1 more source

Miniaturisation of Raman spectroscopy systems: from benchtop to backpocket.

Lab Chip
Hardy M, Kanade PP, Buchan E, Goldberg Oppenheimer P, McPolin CPT, Bowman RM.   +5 more
europepmc   +1 more source

Computational Lithography for Silicon Photonics Design

IEEE Journal of Selected Topics in Quantum Electronics, 2020
A lithography model is built using physical measurements obtained from a fabricated test pattern. The method is able to accurately predict the proximity and smoothing effects characteristic of a 193~nm deep-ultraviolet (DUV) lithography process. The accuracy of the model is verified by visually inspecting the fabricated test patterns and comparing them
Stephen Lin, Mustafa Hammood, Han Yun
exaly   +4 more sources

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AI Computational Lithography

2020 China Semiconductor Technology International Conference (CSTIC), 2020
Machine learning based computational lithography is intended to accelerate the speed of the solutions significantly. There are three critical aspects of AI computational lithography: (1). The feature vector design, (2). The approximate mapping function construction, (3). The model training scheme.
Xuelong Shi, Shoumian Chen
exaly   +2 more sources

Inverse e-beam lithography on photomask for computational lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2013
Computational lithography, e.g., inverse lithography technique (ILT) and source mask optimization, is considered necessary for the “extremely low k1” lithography process of sub-20 nm device node. The ideal design of a curvilinear mask for computational lithography requires many changes during photomask fabrication.
Chan-Uk Jeon
exaly   +2 more sources

Development of a computational lithography roadmap

Proceedings of SPIE, 2008
While lithography R&D community at large has already gotten the mind set for 32nm, all eyes are on 22nm node. Current consensus is to employ computational lithography to meet wafer CD uniformity (CDU) requirement. Resolution enhancement technologies (RET) and model OPC are the two fundamental components for computational lithography.
Hua-Yu Liu, Christian Zuniga, Robert Socha   +2 more
exaly   +2 more sources