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ECS Transactions, 2010
For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
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For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
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Separable OPC models for computational lithography
SPIE Proceedings, 2008The challenge for the upcoming full-chip CD uniformity (CDU) control at 32nm and 22nm nodes is unprecedented with expected specifications never before attempted in semiconductor manufacturing. To achieve these requirements, OPC models not only must be accurate for full-chip process window characterization for fine-tuning and matching of the existing
Hua-Yu Liu +16 more
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Computational lithography for nanostructure science and technology
2007 International Semiconductor Device Research Symposium, 2007There are two paths to nanostructure patterning. Self-assembly is intriguing, as it makes use of the natural tendency of materials to spontaneously coalesce into shapes of technological importance without relying on complex, expensive tools to do the job. But the number of achievable shapes and workable materials is limited, placing severe restrictions
Martin Peckerar +3 more
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Quantum lithography: A non-computing application of quantum information
Informatik - Forschung und Entwicklung, 2006Quantum information theory holds the promise of revolutionizing technologies other than computing and communications. In this article we show how quantum entanglement can be harnessed to beat the Rayleigh diffraction limit of conventional optical lithography, and to permit nano-devices to be fabricated at a scale arbitrarily shorter than the ...
Colin P. Williams +3 more
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Computational Lithography - Moore Bang for your Buck
2009 22nd International Conference on VLSI Design, 2009There have been many pronouncements about the slowing down of Moore’s Law. Human enterprise, however, has managed to disprove these dim prophecies by producing ingenious solutions on a regular basis, to allow Moore’s Law to continue its unabated march. Many of these solutions are coming from the growing field of Computational Lithography.
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Applied Optics, 1993
An efficient storage format was developed for computer-generated holograms for use in electron-beam lithography. This method employs run-length encoding and Lempel-Ziv-Welch compression and succeeds in exposing holograms that were previously infeasible owing to the hologram's tremendous pattern-data file size.
D M, Newman +5 more
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An efficient storage format was developed for computer-generated holograms for use in electron-beam lithography. This method employs run-length encoding and Lempel-Ziv-Welch compression and succeeds in exposing holograms that were previously infeasible owing to the hologram's tremendous pattern-data file size.
D M, Newman +5 more
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A full-chip 3D computational lithography framework
SPIE Proceedings, 20123D lithography simulations capable of modeling 3D effects in all lithographic processes are becoming critical in OPC and verification applications as semiconductor feature sizes continue to shrink. These effects include mask topography, resist profile and wafer topography. In this work we present an efficient computational framework for full-chip 3D
Peng Liu +7 more
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Impact of photomask shape uncertainties on computational lithography
2016 China Semiconductor Technology International Conference (CSTIC), 2016We devise an algorithm that can incorporate the photomask shape uncertainties in computational lithography such as inverse lithography technique. The photomask patterns are expressed by a random field under a level-set framework to represent the uncertain shape variation.
Edmund Y. Lam, Xiaofei Wu
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Optimal feature vector design for computational lithography
Optical Microlithography XXXII, 2019With semiconductor technology progressing beyond 5nm node, there is tremendous pressure on computational lithography to achieve both accuracy and speed. One very promising technique to accomplish this mission is to take full advantage of the maturing machine learning techniques based on neural network architecture.
Xuelong Shi +9 more
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Beyond Lithography: Computers That Assemble Themselves
EDFA Technical Articles, 2005Abstract This article examines current research into the building blocks of the nanoscale system and the techniques used to synthesize them. Also explored are some proposed ideas and the challenges associated with integrating these building blocks into molecular nanosystems such as chemically assembled electronic nanocomputers (CAENs).
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