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Scanner-specific separable models for computational lithography
SPIE Proceedings, 2008The usage of conventional OPC models traditionally was confined to the specific process conditions at which the models were. Separable models for computational lithography (CL), including OPC and post-OPC layout verification, allow extrapolation of the calibrated model and accurate prediction at process conditions different from the exact settings ...
Stefan Hunsche +5 more
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Extreme Ultraviolet Multilayer Defect Compensation in Computational Lithography
Journal of Nanoscience and Nanotechnology, 2016For the extreme ultraviolet (EUV) lithography, multilayer (ML) defects such as bump and pit defects can disrupt the phase of reflected field and degrade aerial images on wafer. In this paper, a defect printability and repair simulator (DPRS) is introduced to predict and repair the effect of ML defects in EUV aerial images.
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Computational lithography: accelerating the future
DTCO and Computational Patterning, 2022openaire +1 more source
Model-informed deep learning for computational lithography with partially coherent illumination
Optics Express, 2020Xu Ma, Qile Zhao, Yihua Pan
exaly
LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing
Advances in Neural Information Processing Systems 36, 2023Su Zheng +4 more
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Optical and EUV projection lithography: A computational view
Microelectronic Engineering, 2015Andreas Erdmann +2 more
exaly
ML for Computational Lithography: Practical Recipes
Proceedings of the 30th Asia and South Pacific Design Automation Conferenceopenaire +1 more source