Results 141 to 150 of about 2,906 (237)

Current‐Driven Nonreciprocal Response of Nonequilibrium Skyrmions

Advanced Science, Volume 13, Issue 31, 4 June 2026.
A skyrmion holds great promise for spintronic applications owing to its intrinsic topological stability and high mobility under ultra‐low current excitation. Here, by means of in situ electron microscopy, we demonstrate a skyrmion diode effect and the associated current‐driven nonreciprocal skyrmion dynamics in a designed FeGe‐based microdevice.
Xiuzhen Yu, Soju Furuta, Xichao Zhang, Yi‐Ling Chiew, Kiyomi Nakajima, Kosuke Karube, Naoya Kanazawa, Yasujiro Taguchi, Yoshinori Tokura, Masahito Mochizuki, Fumitaka Kagawa   +10 more
wiley   +1 more source

Optimization of deep reactive ion etching process

, 2019
This bachelor thesis deals with optimization of cryogenic and Bosch deep reactive ion etching (DRIE) processes. The thesis describes characterization of silicon etching methods, the principle of DRIE and the influence of individual parameters on the ...
Houška, David
core  

Altering the Fluorination Anodization Pathway of Silicon Near an Electrolyte Freezing Point Promotes the Formation of Blue-Photoluminescent Microstructures. [PDF]

ACS Appl Mater Interfaces
Chiou YS, Cheng CC, Li RW, Lee BT.
europepmc   +1 more source

Engineered Interfacial Control for Suppression of Phase Instability: Operando Visualization from Device to Module Scale

Advanced Science, Volume 13, Issue 31, 4 June 2026.
Operando real‐time current density–voltage absorption spectroscopy visualizes spatial phase evolution in mixed‐halide perovskites from device to module scale. Phase instability preferentially initiates in regions with insufficient carrier extraction, revealing electrical boundary conditions as governing factors.
Hangyeol Choi, Soo Woong Jeon, Wookyung Jeon, You‐Hyun Seo, Gill Sang Han, Myunghun Shin, Ji‐Sang Park, Jun Hong Noh, Yohan Yoon   +8 more
wiley   +1 more source

Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO₂ and SiN. [PDF]

Small Methods
Hsiao SN, Sekine M, Suda R, Kihara Y, Hori M.   +4 more
europepmc   +1 more source

Practical Lithium–Sulfur Batteries: An Integrated Design Roadmap from High‐Loading Cathodes to High‐Energy Pouch Cells

Advanced Science, Volume 13, Issue 33, 15 June 2026.
This review presents an integrated design roadmap for practical lithium–sulfur batteries, moving beyond isolated material breakthroughs to the synergistic combination of three interdependent frontiers: Scale‐Up, Electrolyte‐Cathode Synergy, and AI/ML Data‐Driven Design.
Shihzad Shakil, Fan Wang, Lejun Fu, Yuye Huang, Hanhui Lei, Jiarui Huang, Terence Xiaoteng Liu   +6 more
wiley   +1 more source

Deep silicon etching: STiGer vs. BOSCH

, 2016
International audienceSilicon deep etching is widely used in microelectronics and micro-electro-mechanical systems (MEMS). To achieve deep etching, cryogenic and Bosch processes are commonly used.
Lefaucheux, Philippe, Tillocher, Thomas, Cui, Ying, Dussart, Remi, Tu, Chengkun   +4 more
core  

Electrically and Magnetically Tunable Charge–Density–Wave Transport in Quasi‐2D h‐BN/1T‐TaS2 Field Effect Devices

Advanced Electronic Materials, Volume 12, Issue 11, 8 June 2026.
Perpendicular electric and magnetic fields are used to control charge‐density‐wave (CDW) domain dynamics in quasi‐two‐dimensional h‐BN/1T‐TaS2 field‐effect devices. Electrical gating produces a non‐monotonic modulation of the CDW depinning threshold — behavior distinct from quasi‐one‐dimensional CDW systems.
Jonas O. Brown, Maedeh Taheri, Nicholas R. Sesing, Tina T. Salguero, Alexander A. Balandin   +4 more
wiley   +1 more source

Advances in Systems Engineering of Carbon Dioxide Electroreduction

Carbon and Hydrogen, Volume 28, Issue 2, Page 150-171, June 2026.
Industrializing CO2 electroreduction hinges on holistic systemic synergy and optimization of all process segments rather than isolated catalytic breakthroughs; Process simulation is a core enabler to build a complete capture–conversion–product industrial chain, positioning CO2RR as a key technology for carbon neutrality.
Weixiang Xiong, Guangxing Yang, Minglong Guo, Qiao Zhang, Zhiting Liu, Hao Yu, Feng Peng   +6 more
wiley   +1 more source

Cryogenic cyclical etching of Si using CF$_4$ plasma passivation steps: The role of CF radicals

International audienceThis article is selected by the editors of APL as Featured Collection. Ultraviolet (UV) absorption spectroscopy is used to monitor the CF radical density in CF4 inductively coupled plasma (ICP) plasmas as a function of the ...
Nos, Jack, Lefaucheux, Philippe, Tillocher, Thomas, Iséni, Sylvain, Cunge, Gilles, Dussart, Rémi, Kogelschatz, Martin, Despiau-Pujo, Émilie   +7 more
core   +1 more source