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Black silicon formation using cryogenic etching and photoresist layer
Была проведена серия экспериментов по разработке технологии плазменного травления черного кремния через слой полидиметилглутаримида (PMGI) фоторезиста. Кремниевые пластины предварительно подвергались жидкой химической обработке. Слой фоторезиста толщиной ~25 нм способствует процессу создания регулярных структур черного кремния на подложках диаметром ...Vyacheslavova, Ekaterina +6 more
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On the low temperature limits for cryogenic etching: A quasi in situ XPS study
Applied Surface Science, 2023Felipe Cemin, Christophe Cardinaud
exaly
The Investigation of CF3I For High-Aspect-Ratio Cryogenic Dielectric Etch
2023 China Semiconductor Technology International Conference (CSTIC), 2023Jianqiu Hou +3 more
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Fabrication of nanoelectromechanical resonators using a cryogenic etching technique
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2006N. Nelson-Fitzpatrick +5 more
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Cryogenic etching for pattern transfer into silicon of Mix-and-Match structured resist layers
Microelectronic Engineering, 2020Weidenfeller, Ivo W Rangelow
exaly
Investigation of Gas Condensation in Pores of Nanoporous Dielectrics in Cryogenic Etching Conditions
Russian Microelectronics, 2023R. A. Gaidukasov, A. V. Miakonkikh
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High Aspect Ratio Contact Profile Control and Cryogenic Etch Process
2021 International Workshop on Advanced Patterning Solutions (IWAPS), 2021Jie Luo +5 more
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