Results 31 to 40 of about 2,906 (237)

Influence of wet etching in KOH on defects in silicon nanowires formed by cryogenic dry etching

Journal of Physics: Conference Series, 2020
Abstract The work is devoted to exploration of arrays of vertical aligned silicon nanowires (SiNWs) obtained by cryogenic dry etching in ICP mode with height of 4.5-5.5 μm and aspect ratio of 7. It was shown that geometry of nanowires has crucial influence on rate of wet etching in KOH since it is higher for 3D objects than for planar ...
A I Baranov, D A Kudryashov, I A Morozov, A V Uvarov, K Yu Shugurov, A S Gudovskikh   +5 more
openaire   +1 more source

Fabrication of ZnO Nanorods on MEMS Piezoresistive Silicon Microcantilevers for Environmental Monitoring

Proceedings, 2017
In this study, a ZnO nanorods (NRs) patterned MEMS piezoresistive silicon micro-cantilever was fabricated as environmental monitor. The fabrication starts from bulk silicon, utilizing photolithography, diffusion, inductively coupled plasma (ICP ...
Jiushuai Xu, Maik Bertke, Alaaeldin Gad, Feng Yu, Gerry Hamdana, Andrey Bakin, Erwin Peiner   +6 more
doaj   +1 more source

Computational fluid dynamics modeling of a wafer etch temperature control system

Digital Chemical Engineering, 2023
Next-generation etching processes for semiconductor manufacturing exploit the potential of a variety of operating conditions, including cryogenic conditions at which high etch rates of silicon and very low etch rates of the photoresist are achieved. Thus,
Henrique Oyama, Kip Nieman, Anh Tran, Bernard Keville, Yewei Wu, Helen Durand   +5 more
doaj   +1 more source

Lumped element granular aluminum resonators with high kinetic inductances

AIP Advances, 2021
Recently, a new kind of distributed element superconducting resonators with granular aluminum (grAl) has been developed for circuit quantum electrodynamics. Given that lumped element resonators possess certain advantages over the distributed element ones,
Q. He, P. OuYang, M. Dai, H. Guan, J. Hu, S. He, Y. Wang, L. F. Wei   +7 more
doaj   +1 more source

SiOxFy layer deposition for cryogenic nanoscale etching

, 2021
International audienceCryogenic deep etching of Silicon is a well-known process. It consists in using SF6 / O2 plasma in order to etch Si anisotropically. A pure SF6 plasma etches isotropically Si by creating SiF4 etch by-products.
Nos, Jack, Cardinaud, Christophe, Kim, Honjin, Lefaucheux, Philippe, Faguet, Jacques, Tillocher, Thomas, Antoun, Gaelle, Wang, Mingmei, Zhang, Du, Dussart, Remi, Maekawa, Kaoru, Girard, Aurélie   +11 more
core   +1 more source

High Strain Rate and Stress-State-Dependent Martensite Transformation in AISI 304 at Low Temperatures

Metals, 2022
Deformation-induced martensitic transformation as the basis of a hardening process is dependent, among others, on the stress state. In applications such as cryogenic cutting, where a hardened martensitic subsurface can be produced in metastable ...
Lara Vivian Fricke, Gregory Gerstein, Andreas Kotzbauer, Bernd Breidenstein, Sebastian Barton, Hans Jürgen Maier   +5 more
doaj   +1 more source

Proposals for Next-Generation Eco-Friendly Non-Flammable Refrigerants for a −100 °C Semiconductor Etching Chiller Based on 4E (Energy, Exergy, Environmental, and Exergoeconomic) Analysis

Energies
Recent advancements in cryogenic etching, characterized by high aspect ratios and etching rates, address the growing demand for enhanced performance and reduced power consumption in electronics. To precisely maintain the temperature under high loads, the
Hye-In Jung, Chang-Hyo Son, Joon-Hyuk Lee   +2 more
doaj   +1 more source

Dense high aspect ratio nanostructures for cell chip applications - Fabrication, replication, and cell interactions

Micro and Nano Engineering, 2022
Culturing human cells on the surface of a microchip brings living cells in direct contact with artificial microstructured surfaces. This work focuses on the effect of high aspect ratio nanostructures – dense nanoneedle arrays – on the mechanical response
Markus Pribyl, Philipp Taus, Sonia Prado-López, Samuele M. Dozio, Werner Schrenk, Michael J. Haslinger, Sonja Kopp, Michael Mühlberger, Heinz D. Wanzenboeck   +8 more
doaj   +1 more source

Cryogenic Electron Beam Induced Chemical Etching

, 2016
Cryogenic cooling is used to enable efficient, gas-mediated electron beam induced etching (EBIE) in cases where the etch rate is negligible at room and elevated substrate temperatures.
Aiden A. Martin (1721689), Milos Toth (1566940)   +1 more
core   +1 more source

Nanofabrication of SOI-Based Photonic Waveguide Resonators for Gravimetric Molecule Detection

Proceedings, 2019
A silicon photonic microresonator comprising two curved vertical grating couplers and a single suspended Si nanowaveguide (NWG) is developed to investigate the giant enhanced Brillouin scattering in subwavelength NWGs caused by photon-phonon interaction.
Tony Granz, Julia Sophie Böke, Gerry Hamdana, Michael Martens, Arijit Misra, Stefan Preußler, Meinhard Schilling, Erwin Peiner, Thomas Schneider, Andreas Waag   +9 more
doaj   +1 more source