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Degradation of residual pharmaceuticals through an accelerated oxidation process using deep ultraviolet (DUV) light and a TiO2/BDD composite electrode

Ceramics International
Ken-Ichi Katsumata, Norihiro Suzuki, Chiaki Terashima +2 more
exaly +2 more sources

ToF–SIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

Microelectronic Engineering, 2011
Arsenic implanted 248nm DUV photoresist films were characterized by ToF-SIMS and XPS analysis methods. The effect of the implant dose and energy on the formation of the crust layer on top of the bulk photoresist was studied. The crust layer thickness was found to be dependent on the implant energy and dose. The elemental and chemical changes induced by
A. Franquet +7 more
openaire +1 more source

Shape‐Topology‐Driven Design of Deep Ultraviolet Nonlinear Optical Crystals: Engineering [CH ₃ PO ₃ ]–Metal‐Oxo Layered Frameworks for Enhanced SHG, DUV Transparency

Laser & Photonics Reviews
ABSTRACT Designing deep ultraviolet (DUV) nonlinear optical (NLO) crystals that balance high nonlinear coefficients, moderate birefringence, and DUV transparency remains a major challenge. Here, we introduce a shape‐topology‐driven strategy to design novel layered DUV NLO materials using polar covalent tetrahedral
Chengming Hu +7 more
openaire +1 more source

Fluorescence lifetime imaging microscopy (FLIM) with deep-ultraviolet (DUV) illumination