Results 241 to 250 of about 53,870 (328)

Experimental study of inductively coupled plasma etching of patterned single crystal diamonds. [PDF]

Sci Rep
Zhao L, Wang X, Jiang N, Nishimura K, Yi J, Fang S.   +5 more
europepmc   +1 more source

Wafer-Bonded AlGaInP Red LEDs with Suppressed S-Droop through Surface Sulfidation. [PDF]

ACS Appl Mater Interfaces
Lee JS, Mun SH, Shin S, Kim RY, Lee SH, Cha S, Han HS, Kim KP, Kwak HM, Baik J, Choi SY, Kim SJ, Jeong WL, Kim JY, Jo SC, Kang CM, Lee DS.   +16 more
europepmc   +1 more source

Overcoming Material Incompatibility via 2D Free-Surface Engineering. [PDF]

Adv Mater
Bioud YA, Bouchilaoun M, Schreiber W, Amrar R, Patriarche G, Ma T, Ohlmann J, Soltani A, Lackner D, Janz S.   +9 more
europepmc   +1 more source

Low-dimensional materials for intracellular electrophysiology: advances from synthesis to applications. [PDF]

Microsyst Nanoeng
Li A, Liang T, Niu L, Wang C, Hu N, Li Y.   +5 more
europepmc   +1 more source

Tapered Cladding Design for Monolithic Waveguide-Photodetector Coupling in Si-Based Integrated Photonics. [PDF]

Nanomaterials (Basel)
Gonzalez-Fernandez AA, Vazquez-Hernandez JA, Aguilar-Valdez F, Moffat N.   +3 more
europepmc   +1 more source

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Reactive ion etching and deep reactive ion etching processes

2nd International Conference on Mechanical, Electronics, and Electrical and Automation Control (METMS 2022), 2022
Semiconductor technology is a new technology that has only begun to develop in recent decades, but after just a few decades of development, it has become one of the largest industries in the world today, and it exists in many products in our daily lives.
YiHan WU, HaiLin He
openaire   +2 more sources

Deep Reactive Ion Etching

Handbook of Silicon Based MEMS Materials and Technologies, 2010
This chapter discusses the deep reactive ion etching in detail. Reactive Ion Etching (RIE), also known as plasma etching or dry etching, and its extension deep reactive ion etching (DRIE) are processes that combine physical and chemicals effect to remove
Laermer, Franz, Franssila, Sami, Sainiemi, Lauri, Kolari, Kai   +3 more
semanticscholar   +7 more sources

Ultrahigh Resolution Titanium Deep Reactive Ion Etching

ACS Applied Materials & Interfaces, 2017
Titanium (Ti) represents a promising new material for microelectromechanical systems (MEMS) because of its unique properties. Recently, this has been made possible with the advent of processes that enable deep reactive ion etching (DRIE) of high-aspect-ratio (HAR) structures in bulk Ti substrates.
Bryan W. K. Woo, Shannon C. Gott, Ryan A. Peck, Dong Yan, Mathias W. Rommelfanger, Masaru P. Rao   +5 more
openaire   +3 more sources