Results 161 to 170 of about 2,694 (179)
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Developing terahertz filters using the deep reactive ion etching (DRIE) process
2016 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP), 2016This paper introduces some recent developments of terahertz bandpass filters. By adopting dual-resonating-mode cavities, transmission zeroes are obtained in the design, which greatly improve the selectivity of the terahertz bandpass filters. As demonstrations, terahertz bandpass filters having a center frequency of 400 GHz have been fabricated by using
Zhang-Cheng Hao, Wei Hong
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Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes
SPIE Proceedings, 2005In typical DRIE processes, the etch rate variation across the wafer increases with pattern density, severely limiting the pattern densities that can be used at a specified etch rate tolerance. Here, we present a scheme for including uniformity-improving dummy structures in the etch mask layout that enable the use of high-density patterns in many DRIE ...
Ulrich J Quaade, Ole Hansen
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High-power optical microswitch fabricated by deep reactive ion etching (DRIE)
SPIE Proceedings, 2003Development of a high power optical micro switch fabricated by deep reactive ion etching (DRIE) in silicon on insulator (SOI) substrates is presented. The devices discussed are a key component in a MEMS-based, Naval safety and arming (S&A) system for use in underwater weapons.
Don L Devoe
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AN ultra-low cost deep reactive ion etching (drie) tool for flexible, small volume manufacturing
2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS), 2015Our goal is to demonstrate that we can achieve a radical reduction in the capital cost of micro/nano-manufacturing without sacrificing performance by scaling production throughput. As a demonstration of this concept, we show for the first time a DRIE system that processes small substrates (∼1 in2) with performance comparable to commercial systems for a
P.A. Gould +4 more
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MRS Proceedings, 1999
AbstractFluorocarbon films are useful as antistiction films for suspended structure and also for electrical isolation purposes. Furthermore, due to their low dielectric constant and ease of deposition they are useful for VLSI manufacturing applications. Thus, in the interest of building a complete database for these plasma generated fluorocarbon films,
A. A. Ayón +5 more
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AbstractFluorocarbon films are useful as antistiction films for suspended structure and also for electrical isolation purposes. Furthermore, due to their low dielectric constant and ease of deposition they are useful for VLSI manufacturing applications. Thus, in the interest of building a complete database for these plasma generated fluorocarbon films,
A. A. Ayón +5 more
openaire +1 more source
Deep Reactive Ion Etching of Through Silicon Vias
, 2008 This chapter contains sections titled: • Introduction • DRIE Equipment and Characterization • DRIE Processing • Practical Solutions in Via Etching • Concluding Remarks • Appendix A: Glossary of Abbreviations • Appendix B: Examples of DRIE Recipes ...
F Roozeboom +2 more
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