Results 181 to 190 of about 20,942 (191)
Some of the next articles are maybe not open access.
Experiences in making DUV lithographic objectives
Optical Society of America Annual Meeting, 1992 Since only fused silica can be obtained with good enough homogeneity, most lithographic objectives for use below 300 nm are only corrected for very narrow wavelength ranges. As a result these objectives have to be used with wavelength narrowed excimer lasers. By going to catadioptric objectives both high N.A.openaire +1 more sourceDUV Lithography
2012 Biana Godin, Elka Touitou, Rajaram Krishnan, Michael J. Heller, Nicolas G. Green, Hossein Nili, David J. Bakewell, Didi Xu, Arunkumar Subramanian, Lixin Dong, Bradley J. Nelson, Yi Zhang, Rüdiger Berger, Hans-Jürgen Butt, Seong H. Kim, Nicolas Lafitte, Yassine Haddab, Yann Gorrec, Momoko Kumemura, Laurent Jalabert, Christophe Yamahata, Nicolas Chaillet, Dominique Collard, Hiroyuki Fujita, Yabing Qi, Avinash P. Nayak, M. Saif Islam, V. J. Logeeswaran, Garry J. Bordonaro, Vladimir Gubala, Thomas Nowotny, Pablo Varona +31 moreopenaire +1 more sourceDUV Photolithography and Materials
2012 Biana Godin, Elka Touitou, Rajaram Krishnan, Michael J. Heller, Nicolas G. Green, Hossein Nili, David J. Bakewell, Didi Xu, Arunkumar Subramanian, Lixin Dong, Bradley J. Nelson, Yi Zhang, Rüdiger Berger, Hans-Jürgen Butt, Seong H. Kim, Nicolas Lafitte, Yassine Haddab, Yann Gorrec, Momoko Kumemura, Laurent Jalabert, Christophe Yamahata, Nicolas Chaillet, Dominique Collard, Hiroyuki Fujita, Yabing Qi, Avinash P. Nayak, M. Saif Islam, V. J. Logeeswaran, Garry J. Bordonaro, Vladimir Gubala, Thomas Nowotny, Pablo Varona +31 moreopenaire +1 more source
