Results 21 to 30 of about 138,462 (342)
The role of antiphase boundaries during ion sputtering and solid phase epitaxy of Si(001)
The Si(001) surface morphology during ion sputtering at elevated temperatures and solid phase epitaxy following ion sputtering at room temperature has been investigated using scanning tunneling microscopy. Two types of antiphase boundaries form on Si(001)
Bedrossian +31 more
core +1 more source
Transmission Electron Microscopy on Interface Engineered Superconducting Thin Films [PDF]
Transmission electron microscopy is used to evaluate different deposition techniques, which optimize the microstructure and physical properties of superconducting thin films.
Bals, Sara +5 more
core +3 more sources
Nanostructured SnO(x) films were obtained by molecular beam epitaxy (MBE). The morphology, structure, and optical properties of obtained films annealed in the temperature range of 200 °C–1000 °C were studied.
Vyacheslav A Timofeev +8 more
doaj +1 more source
Control of InGaAs facets using metal modulation epitaxy (MME)
Control of faceting during epitaxy is critical for nanoscale devices. This work identifies the origins of gaps and different facets during regrowth of InGaAs adjacent to patterned features.
Baraskar, Ashish K. +8 more
core +1 more source
Phase transformation characteristics of barium strontium titanate films on anisotropic substrates with (001)//(001) epitaxy [PDF]
The role of anisotropic misfit strains on the spontaneous polarization of (100) oriented Ba0.6Sr0.4TiO3 thin films on (100) orthorhombic substrates is theoretically analyzed.
Akcay, Gursel +3 more
core +1 more source
Nature of the Pits on the Lattice-Matched InAlAs Layer Surface Grown on the (001) InP Substrate
The structural properties of lattice-matched InAlAs/InP layers grown by molecular beam epitaxy have been studied using atomic force microscopy, scanning electron microscopy and micro-photoluminescence spectroscopy.
Dmitrii V. Gulyaev +8 more
doaj +1 more source
Elemental boron doping behavior in silicon molecular beam epitaxy [PDF]
Boron-doped Si epilayers were grown by molecular beam epitaxy (MBE) using an elemental boron source, at levels up to 2×1020 cm−3, to elucidate profile control and electrical activation over the growth temperature range 450–900 °C.
C. P. Parry +10 more
core +1 more source
Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications
Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai +8 more
wiley +1 more source
A new principle for supplying volatile precursors to MOCVD gas-phase chemical deposition systems is proposed, based on a two-stage evaporation of an organic solution of precursors from a soaked cotton thread, which passes sequentially through the zones ...
Andrey R. Kaul +3 more
doaj +1 more source
Applications of remote epitaxy and van der Waals epitaxy
AbstractEpitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations.
Ilpyo Roh +8 more
openaire +3 more sources

