Results 1 to 10 of about 11,104 (255)
Growth of GaAs Epitaxial Microcrystals by Droplet Epitaxy.
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Highly Oriented Epitaxial Hexagonal Boron Nitride Multilayers on High-Temperature-Resistant Single-Crystal Aluminum Nitride (0001). [PDF]
Yang X +10 more
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Interfacial Charge Transfer in Lead Sulfide/Cadmium Sulfide Quantum Dot-Monolayer Molybdenum Disulfide Heterostructures. [PDF]
Li M, Fron E, Cotlet M.
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Growth of rhombohedral-stacked single-crystal WS<sub>2</sub>/MoS<sub>2</sub> vertical heterostructures. [PDF]
Chen J +18 more
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Characterization of Complex Stacking of Semiconductors Through Near Field Imaging and Spectroscopy. [PDF]
Tailpied L +8 more
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Monolithic electro-optic platform on silicon with bandwidth of 100 GHz and beyond. [PDF]
Steckler D +12 more
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Some of the next articles are maybe not open access.
MRS Proceedings, 1981
The formation and structures of epitaxial CoSi2, NiSi2, Pd2 Si and PtSi films on silicon are reviewed. Polycrystalline films of reasonable epitaxial quality can be grown with sharp interfaces on Si(111) by conventional deposition and heating techniques. The interfaces on (100) substrates, however, are faceted.
R.T. Tung +4 more
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The formation and structures of epitaxial CoSi2, NiSi2, Pd2 Si and PtSi films on silicon are reviewed. Polycrystalline films of reasonable epitaxial quality can be grown with sharp interfaces on Si(111) by conventional deposition and heating techniques. The interfaces on (100) substrates, however, are faceted.
R.T. Tung +4 more
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Epitaxial strain and epitaxial bending
Surface Science, 1996The relation between the curvatures of an epitaxial film-substrate system and the epitaxial strain in the film is generalized to an arbitrary substrate surface of an arbitrary crystal structure. The determination of elastic constants of epitaxial film material from curvature measurements is compared with the determination from bulk perpendicular strain
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AT&T Technical Journal, 1980
Molecular beam epitaxy is an ultrahigh vacuum technique for growing very thin epitaxial layers of semiconductor crystals. Because it is inherently a slow growth process, extreme dimensional control over both major compositional variations and impurity incorporation can be achieved.
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Molecular beam epitaxy is an ultrahigh vacuum technique for growing very thin epitaxial layers of semiconductor crystals. Because it is inherently a slow growth process, extreme dimensional control over both major compositional variations and impurity incorporation can be achieved.
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Epitaxy of MgO magnetic tunnel barriers on epitaxial graphene
Nanotechnology, 2013Epitaxial growth of electrodes and tunnel barriers on graphene is one of the main technological bottlenecks for graphene spintronics. In this paper, we demonstrate that MgO(111) epitaxial tunnel barriers, one of the prime candidates for spintronic application, can be grown by molecular beam epitaxy on epitaxial graphene on SiC(0001).
Godel, Florian +8 more
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