Results 71 to 80 of about 157,681 (294)

Experimental study of inductively coupled plasma etching of patterned single crystal diamonds

open access: yesScientific Reports
In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas.
Lei Zhao   +5 more
doaj   +1 more source

Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication

open access: yesMicromachines, 2020
Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices.
Valdemar Stankevič   +3 more
doaj   +1 more source

Towards Defect Phase Diagrams: From Research Data Management to Automated Workflows

open access: yesAdvanced Engineering Materials, EarlyView.
A research data management infrastructure is presented for the systematic integration of heterogeneous experimental and simulation data required for defect phase diagrams. The approach combines openBIS with a companion application for large‐object storage, automated metadata extraction, provenance tracking and federated data access, thereby supporting ...
Khalil Rejiba   +5 more
wiley   +1 more source

Phase Field Failure Modeling: Brittle‐Ductile Dual‐Phase Microstructures under Compressive Loading

open access: yesAdvanced Engineering Materials, EarlyView.
The approach by Amor and the approach by Miehe and Zhang for asymmetric damage behavior in the phase field method for fracture are compared regarding their fitness for microcrack‐based failure modeling. The comparison is performed for the case of a dual‐phase microstructure with a brittle and a ductile constituent.
Jakob Huber, Jan Torgersen, Ewald Werner
wiley   +1 more source

Review of plasma etching processes for III-V semiconductorsMendeley Data

open access: yesMicro and Nano Engineering
This paper provides a comprehensive literature review and analysis of III-V semiconductor plasma etching, highlighting key etching considerations and providing literature references to inform future process development. Plasma etching processes for III-V
Alison Clarke   +3 more
doaj   +1 more source

Comparison of the clinical parameters of restorations performed with total-etch and self-etch adhesive techniques

open access: yesEndodontics Today
AIM. To conduct a systematic review to evaluate the differences between the clinical performance of restorations made with total-etch and self-etch techniques.MATERIALS AND METHODS. A literature search was conducted in the Pubmed, Google Scholar and Cyberleninka databases. The research was done according to the PICO strategy.
Z. S. Khabadze   +8 more
openaire   +2 more sources

Nanostructuring lithium niobate substrates by focused ion beam milling

open access: yes, 2005
We report on two novel ways for patterning Lithium Niobate (LN) at submicronic scale by means of focused ion beam (FIB) bombardment. The first method consists of direct FIB milling on LiNbO3 and the second one is a combination of FIB milling on a ...
A. Sabac   +11 more
core   +4 more sources

Understanding the Stochastic Nature of Process Parameter Development of Blown Powder Laser Beam Directed Energy Deposition Additive Manufacturing of Pure Molybdenum

open access: yesAdvanced Engineering Materials, EarlyView.
Identified through the use of statistical design of experiments and metallographic investigation, this study exposes the stochastic origins of intergranular cracks in blown powder laser beam directed energy deposition additive manufacturing of pure molybdenum. It further demonstrates a successful crack mitigation approach with direct correlation to the
Nathaniel J. Lies   +2 more
wiley   +1 more source

Evaluation of SB effect onto eutectic SI changes and mechanical properties in an 4xxx AL cast alloys series

open access: yesProduction Engineering Archives, 2014
The purpose of this article is to examine the effect of modifier based on AlSb10 on the structure and mechanical properties of the AlSi7Mg0.3 and AlSi6Cu4 cast alloys.
Lenka Hurtalová   +3 more
doaj  

Fabrication of microchannels in lithium tantalate by selective etching of structures inscribed with a femtosecond laser

open access: yesJPhys Photonics
Selective etching of material areas modified by femtosecond laser pulses in the volume of lithium tantalate has been applied to produce hollow microchannels. In a fully monolithic approach, microchannels up to 2.5 mm long with cross sections of 2.5 µ m ×
Kore Hasse   +4 more
doaj   +1 more source

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