Effect of Yttrium Oxide Impurities on the Structure and Properties of Metallic Hafnium [PDF]
The influence of yttrium oxide impurity content of 0 to 0.4 wt.% on the structure and microhardness metal hafniuminvestigated. It is shown that grain size decreases and the Microhardness of hafnium increases monotonically with increasing content of ...
S. V. Chornobuk +2 more
doaj +2 more sources
This study compares the performance of two types of capacitive devices, indium tin oxide-aluminum oxide-zirconia aluminum oxide-silicon oxide-silicon (IAZAOS) and indium tin oxide-aluminum oxide-hafnium aluminum oxide-silicon oxide-silicon (IAHAOS), as ...
Fun-Cheng Jong, Wen-Ching Hsieh
doaj +2 more sources
Ultrafast and accurate prediction of polycrystalline hafnium oxide phase-field ferroelectric hysteresis using graph neural networks [PDF]
International audienceAccelerate ferroelectric material discovery with a highly accurate and efficient Graph Neural Network predicting hysteresis in polycrystalline hafnium ...
Brice, Gautier +2 more
core +2 more sources
Effect of Lanthanum‐Aluminum Co‐Doping on Structure of Hafnium Oxide Ferroelectric Crystals [PDF]
Hafnium oxide (HfO2)‐based devices have been extensively evaluated for high‐speed and low‐power memory applications. Here, the influence of aluminum (Al) and lanthanum (La) co‐doping HfO2 thin films on the ferroelectric characteristics of hafnium‐based ...
Zhenhai Li +12 more
doaj +2 more sources
Measurement and analysis of the resolved resonance cross sections of the natural hafnium isotopes [PDF]
Hafnium is a ductile metallic element with a large neutron absorption cross section. It can be used in reactor control rods to regulate the fission process. The NEA High Priority Request List for nuclear data presents a need for improved characterisation
Ware, Timothy Christopher
core +7 more sources
Ferroelectric Polarization Enhancement in Hafnium-Based Oxides Through Capping Layer Engineering
In this work, we investigate that the capping layer (CL) engineering of aluminum oxide (AlOx) on the dopant-free hafnium oxide (HfOx) and the hafnium zirconium oxide (HfZrOx) ferroelectric metal-ferroelectric-metal (MFM) capacitors. The AlOx CL featuring
Hsuan-Han Chen +5 more
doaj +1 more source
Hafnium oxidation at high temperature in steam
To assess the potential impact of using hafnium as absorber material in LWRs in high temperature accidental situations, the oxidation behavior of hafnium was studied up to 1400 °C, i.e. at temperature conditions relevant to severe accidents. Different sample geometries were tested and oxidized in steam/argon mixtures, either in a furnace or in a ...
Guilbert, Severine +5 more
openaire +4 more sources
A Study on Imprint Behavior of Ferroelectric Hafnium Oxide Caused by High‐Temperature Annealing
Hafnium oxide is found to be a favorable material for ferroelectric nonvolatile memory devices. Its compatibility with complementary metal-oxide-semiconductor processes, the relatively low crystallization temperature when zirconium-doped, and the ...
Thiem, Steffen +27 more
core +1 more source
Solution‐processed microelectronics offer advantages, including cost‐effectiveness, higher energy efficiency, and compatibility with rapid prototyping compared to their counterparts fabricated through traditional semiconductor manufacturing processes ...
Yutong Liu +5 more
doaj +1 more source
Reduction of hafnium oxide and hafnium silicate by rhenium and platinum [PDF]
We report chemical interactions of Hf-based dielectrics with Re and Pt overlayers during annealing. Reduction of the Hf to a suboxide is observed by x-ray photoelectron spectroscopy, along with a decrease in total oxygen content measured by medium-energy ion scattering.
M. Copel +3 more
openaire +1 more source

