Results 21 to 30 of about 3,150 (261)

Explorative study on the antibacterial effects of 3D-printed PMMA/nitrides composites

open access: yesMaterials & Design, 2021
Following the rising interested on 3D-printing technologies, this research explores the possibility to apply nitride-polymethylmethacrylate composite coatings on 3D printed parts in order to increase their resistance to bacteria colonization.
Elia Marin   +5 more
doaj   +1 more source

Assessment of Surface Roughness and Wettability of Hafnium Oxide Coated Titanium Discs: An In-vitro Analysis [PDF]

open access: yesJournal of Clinical and Diagnostic Research
Introduction: Surface modifications of titanium implants play a crucial role in enhancing their performance, particularly in terms of surface roughness and wettability, which directly influence osseointegration and biological responses.
Meghan Ranjan Singh   +3 more
doaj   +1 more source

Charge Compensation in Europium-Doped Hafnia Nanoparticles: Solvothermal Synthesis and Colloidal Dispersion

open access: yesCrystals, 2021
Effective charge compensation of europium in hafnium oxide nanoparticles was achieved at low temperature, allowing high doping incorporation (up to 6 at.%) and enhanced luminescence.
Xavier H. Guichard   +2 more
doaj   +1 more source

SOME PROPERTIES OF HAFNIUM OXIDE, HAFNIUM SILICATE, CALCIUM HAFNATE AND HAFNIUM CARBIDE

open access: yesJournal of the American Ceramic Society, 1954
The behavior of hafnium oxide was studied particularly in the temperature range 1500° to 18OO°C. Properties of HfO 2 at these temperatures and its reactions with ZrO 2 , SiO 2 , and CaO are given in terms of ...
C Curtis, L Doney, J Johnson
openaire   +3 more sources

Effect of Yttrium Oxide Impurities on the Structure and Properties of Metallic Hafnium

open access: yesФізика і хімія твердого тіла, 2017
The influence of yttrium oxide impurity content of 0 to 0.4 wt.% on the structure and microhardness metal hafniuminvestigated. It is shown that grain size decreases and the Microhardness of hafnium increases monotonically with increasing content of ...
S. V. Chornobuk   +2 more
doaj   +1 more source

Enhanced pyroelectric response at morphotropic and field-induced phase transitions in ferroelectric hafnium oxide thin films

open access: yesAPL Materials, 2021
The hafnium oxide material class is characterized by the coexistence of several polymorphs between which phase transitions are induced by means of composition and external electric fields. Pyroelectric materials, which convert heat into electrical energy,
Clemens Mart   +7 more
doaj   +1 more source

Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide

open access: yesJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020
Thermal atomic layer etching (ALE) can be achieved using sequential, self-limiting fluorination and ligand-exchange reactions. Previous studies have demonstrated thermal ALE of amorphous HfO2 and ZrO2 ALD films. This study explored the differences between thermal ALE of amorphous and polycrystalline films of hafnium oxide, zirconium oxide, and hafnium ...
Jessica A. Murdzek, Steven M. George
openaire   +1 more source

2D-3D integration of hexagonal boron nitride and a high-κ dielectric for ultrafast graphene-based electro-absorption modulators

open access: yesNature Communications, 2021
Here, three-dimensional hafnium oxide and two-dimensional hexagonal boron nitride are integrated in the insulating section of double-layer graphene optical modulators, leading to a maximum bandwidth of 39 GHz and enhanced modulation efficiency.
Hitesh Agarwal   +10 more
doaj   +1 more source

Performance Improvement of Total Ionization Dose Radiation Sensor Devices Using Fluorine-Treated MOHOS

open access: yesSensors, 2016
Fluorine-treated titanium nitride–silicon oxide–hafnium oxide–silicon oxide–silicon devices (hereafter F-MOHOS) are candidates for total ionization dose (TID) radiation sensor applications.
Wen-Ching Hsieh   +3 more
doaj   +1 more source

Low-Temperature Atomic Layer Deposited Oxide on Titanium Nitride Electrodes Enables Culture and Physiological Recording of Electrogenic Cells

open access: yesFrontiers in Neuroscience, 2020
The performance of electrode arrays insulated by low-temperature atomic layer deposited (ALD) titanium dioxide (TiO2) or hafnium dioxide (HfO2) for culture of electrogenic cells and for recording of extracellular action potentials is investigated.
Michele Dollt   +7 more
doaj   +1 more source

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