Results 1 to 10 of about 12,880 (229)

Study of AlGaN/GaN Vertical Superjunction HEMT for Improvement of Breakdown Voltage and Specific On-Resistance

open access: yesIEEE Access, 2021
A GaN-based vertical superjunction high electron mobility transistor (SJ HEMT) with a composite structure (CS-SJ HEMT) is proposed and analyzed by Silvaco TCAD to improve the breakdown voltage and specific on-resistance (RonA).
Miao Zhang, Zhiyou Guo, Yong Huang
exaly   +3 more sources

Optimization of enhancement-mode MIS-GaN HEMT with dual channel for simple process using TCAD simulation [PDF]

open access: yesScientific Reports
A metal-insulator-semiconductor (MIS) GaN high electron mobility transistor (HEMT) utilizing a dual-channel structure is demonstrated for enhancement-mode (E-mode) operation using the Synopsys Sentaurus™ technology computer-aided design (TCAD) simulator.
Kang Hee Lee   +3 more
doaj   +2 more sources

Transistors for Solid-State Microwave Switches (A Review)

open access: yesИзвестия высших учебных заведений России: Радиоэлектроника, 2023
Introduction. The characteristics of solid-state microwave switches are subject to different requirements depending on the application area and technical problems to be solved. No versatile solution exists that could satisfy all requirements at once. The
Elena M. Torina   +2 more
doaj   +1 more source

Multi-objective optimization of the high electron mobility transistor

open access: yesInternational Journal for Simulation and Multidisciplinary Design Optimization, 2023
In this paper, we present a new approach to improve the thermo-mechanical performance of the HEMT (high electron mobility transistor) technology. This study aims to solve two optimization problems.
Amar Abdelhamid   +3 more
doaj   +1 more source

Simulation and optimization of HEMTs [PDF]

open access: yes2016 3rd International Conference on Advances in Computational Tools for Engineering Applications (ACTEA), 2016
8 pages, 19 ...
Hesameddin Ilatikhameneh   +2 more
openaire   +2 more sources

Temperature-dependent characteristics for the p-type CuO gate HEMT and high-k HfO2 MIS-HEMT on the Si substrates

open access: yesAIP Advances, 2021
This work presents the temperature-dependent characteristics of the thin-barrier Al0.45Ga0.55N/GaN high electron mobility transistor (HEMT), p-type CuO gate HEMT, and high-k HfO2 metal–insulator–semiconductor HEMT (MIS-HEMT).
Yaopeng Zhao   +7 more
doaj   +1 more source

FUTURE TRENDS IN POWER ELECTRONIC DEVICES [PDF]

open access: yesJournal of Engineering Science (Chişinău), 2019
The recent technological progress of semiconductors and increasing demand for power electronic devices in the different domains of electric energy particularly for applications in aeronautics and networks of transport and distribution impose new ...
Băjenescu, Titu-Marius I.
doaj   +1 more source

Hot electron modelling of HEMTs [PDF]

open access: yes7th International Workshop on Computational Electronics. Book of Abstracts. IWCE (Cat. No.00EX427), 2001
The hot‐electron two‐dimensional HEMT with recessed gate is modelled by solving the Poisson, current continuity and energy transport equations consistently with the Schrödinger equation using a finite difference scheme. New expressions are used for the energy densities inside and outside the quantum wells.
Eric A. B. Cole   +2 more
openaire   +1 more source

The proton flux influence on electrical characteristics of a dual-channel hemt based on GaAs

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2022
The results of the simulation the influence of the proton flux on the electrical characteristics of the device structure of dual-channel high electron mobility field effect transistor based on GaAs are presented.
I. Yu. Lovshenko   +7 more
doaj   +1 more source

Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process

open access: yesETRI Journal, 2023
We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13 μm–0.16 μm to suit the intended application.
Byoung-Gue Min   +7 more
doaj   +1 more source

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