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First vertical-cavity surface-emitting laser made entirely in Poland [PDF]

open access: yesBulletin of the Polish Academy of Sciences: Technical Sciences, 2021
The paper presents the first vertical-cavity surface-emitting lasers (VCSELs) designed, grown, processed and evaluated entirely in Poland. The lasers emit at »850 nm, which is the most commonly used wavelength for short-reach (
Marcin Gębski   +9 more
doaj   +1 more source

Application of Scanning Hall Probe Microscopy Technique at Room Temperature 300K. [PDF]

open access: yesKirkuk Journal of Science, 2018
Active areas of bismuth Hall Probe sensors in the range (0.1 – 1) µm have been fabricated on Si/SiO2 with GaAs substrates at thickness of bismuth from (40, 60 and 70) nm by Electron Beam Lithography (EBL) and lift-off process.
Hussein Ali Mohammed
doaj   +1 more source

Selective Area Epitaxy of GaAs/Ge/Si Nanomembranes: A Morphological Study

open access: yesCrystals, 2020
We demonstrate the feasibility of growing GaAs nanomembranes on a plastically-relaxed Ge layer deposited on Si (111) by exploiting selective area epitaxy in MBE.
Monica Bollani   +8 more
doaj   +1 more source

Specific Design Features of Charge Sensitive Amplifiers on Arsenide-Gallium Master Slice

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2022
For the production of integrated analog circuits with a small-scale integration, which are developed to operate at temperatures up to minus 200 ℃ and/or with absorbed dose of gamma radiation up to 5 Mrad, a gallium arsenide master slice has been created.
O. V. Dvornikov   +3 more
doaj   +1 more source

EFFECTS OF GRADING LAYERS ON GaAs VERTICAL CAVITY SURVACE EMITTING LASER PERFORMANCE [PDF]

open access: yesKirkuk Journal of Science, 2016
This study is an attempt to investigate the effect of grading layers thicknesses and doping on the distributed Bragg reflectors (DBRs) resistivity by using advanced numerical simulation (ISETCAD) .
Ashty M. Aaref, Farah Z. Jasim
doaj   +1 more source

13…67 GHz Frequency Mixer

open access: yesИзвестия высших учебных заведений России: Радиоэлектроника, 2023
Introduction. The requirements for the performance of measuring devices, including their operating frequency, are constantly becoming stricter. This encourages the creation of wide-band microcircuits for application in microwave blocks of devices, such ...
D. S. Danilov   +5 more
doaj   +1 more source

Characterization of Gaas/Si/GaAs Heterointerfaces [PDF]

open access: yesMRS Proceedings, 1989
ABSTRACTTransmission electron microscopy of GaAs grown on Si for metal-semiconductor-metal photodetectors is presented in this paper. Two kinds of samples are compared: GaAs grown on a 15 Å Si epilayer grown on GaAs, and GaAs grown at low temperature (300°C) on Si substrates.
Liliental-Weber, Z., Mariella, R.P.
openaire   +2 more sources

The Effect of Thermal Annealing on the Diffusion Profile of Nickel in GaAs Substrates [PDF]

open access: yesEngineering and Technology Journal, 2009
Diffusion of nickel in GaAs has been studied at 950ºC. The diffusion wasenhanced during limited interval and for different quantities of As. Nickel atomshad diffused in the beginning due to the interstitial movement of atoms but largenumber of nickel ...
Aseel A.K. Hadi
doaj   +1 more source

Estimation of S-Parameters and Dielectric Permittivity of Polycor and GaAs Samples Using a Vector Network Analyzer

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2023
To study the S-parameters and dielectric permittivity of polycor and GaAs samples, a vector network analyzer R4-MWM-118 with a special measuring cell and a modified Nicholson–Ross–Weir method were used.
D. A. Kondrashov   +4 more
doaj   +1 more source

The proton flux influence on electrical characteristics of a dual-channel hemt based on GaAs

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2022
The results of the simulation the influence of the proton flux on the electrical characteristics of the device structure of dual-channel high electron mobility field effect transistor based on GaAs are presented.
I. Yu. Lovshenko   +7 more
doaj   +1 more source

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