Results 71 to 80 of about 16,542 (226)
Power performance capability of metamorphic HEMT on GaAs substrate [PDF]
An In0.3Al0.7As/In0.3Ga0.7As metamorphic power High Electron Mobility Transistor (HEMT) grown on GaAs has been developed. This structure with 30% indium content presents several advantages over PM-HEMT on GaAs and LM-HEMT on InP.
Theron, D. +4 more
core +1 more source
Demonstration of hydrogen sensing operation of AlGaN/GaN HEMT gas sensors in extreme environment
Extreme environment operation of hydrogen gas sensing was demonstrated by AlGaN/GaN high electron mobility transistor (HEMT) sensors under the condition of high temperature and energetic irradiation. The HEMT-type gas sensors were fabricated on AlGaN/GaN-
G.H. Chung, T.A. Vuong, H. Kim
doaj +1 more source
该文通过变温的Hall测量系统地研究了GaAs基HEMT和PHEMT以及InP基HEMT三种结构材料的电子迁移率μ_n和二维电子浓度n_s。仔细地分析了不同HEMT结构材料的散射机制对电子迁移率的影响以及不同HEMT材料结构对电子浓度的影响。研究结果表明InP基HEMT的n_s×μ_n值比GaAs基HEMT和PHEMT的n_s×μm值都大,说明可以用n_s ...
张兴宏 +5 more
core
The paper proposes a new analytical model of the drain current in AlGaN-GaN high-electron-mobility transistors (HEMT) on the basis of a polynomial expression for the Fermi level as a function of the concentration of charge carriers.
A. Farti, A. Touhami
doaj +1 more source
Novel High-Energy-Efficiency AlGaN/GaN HEMT with High Gate and Multi-Recessed Buffer
A novel AlGaN/GaN high-electron-mobility transistor (HEMT) with a high gate and a multi-recessed buffer (HGMRB) for high-energy-efficiency applications is proposed, and the mechanism of the device is investigated using technology computer aided design ...
Shunwei Zhu +7 more
doaj +1 more source
In this paper, a novel, GaN-based high electron mobility transistor (HEMT) using an ultra-thin barrier (UTB) with a local charge compensation trench (LCCT) is designed and optimized.
Zeheng Wang +5 more
doaj +1 more source
用能量为1~1.8MeV、注量为10~13~10~17/cm~2的电子, 对HEMT(高电子迁移率晶体管)材料进行辐照, 得到了材料结构中的二维电子气(2DEG)的电输运性质随辐照电子能量和注量的变化关系, 并进行了讨论。还将该结果与电子辐照P-HEMT和LT-HEMT材料的结果进行了比较 ...
蒋锦江 +4 more
core
A two-dimensional quantum model based on the solution of Schrodinger and Poisson equations is first presented for In0.52Al0.48As/In0.53Ga0.47As/InP HEMT.
Zhang XH Chinese Acad Sci Inst Semicond Lab Semicond Mat Sci POB 912 Beijing 100083 Peoples R China. +3 more
core
In this paper, a novel normally off p-gallium nitride (GaN) gate high electron-mobility transistor (HEMT) with composite AlN/Al0.17Ga0.83N/Al0.3Ga0.7N barrier layers is proposed.
Hsien-Chin Chiu +6 more
doaj +1 more source

