Results 81 to 90 of about 16,542 (226)
利用高电子迁移率晶体管(HEMT)的直流输出分析模型,首次定量地分析了界面态对AlGaAs/GaAs HEMT直流输出特性的影响。考虑界面态的作用,详细分析了不同界面态密度对HEMT的I-V特性和器件跨导的影响。研究结果表明随着界面态密度的增加,栅极电压对电流的控制能力减小 ...
程知群 +5 more
core
In this paper, a novel AlGaN/GaN HEMT structure with a P-GaN buried layer in the buffer layer and a locally doped barrier layer under the gate (PN-HEMT) is proposed to enhance its resistance to single event transient (SET) effects while also overcoming ...
Juan Xiong +4 more
doaj +1 more source
AlGaAs/InGaAs p-HEMT ????????? ?????????????????? ?????? ????????? ????????? ?????? ????????? ????????? DLTS ????????? ???????????? ???????????????. DLTS ??????????????? ????????? ???????????? ?????? (0.50???0.03) eV??? (0.81???0.01) eV??? ????????? ?????
Choi, Kyoung Jin, Lee, Jong-Lam
core
Анализ параметров GaN-HEMT до и после гамма-нейтронного воздействия
Предложен метод математической обработки результатов измерений вольт-фарадных характеристик HEMT AlGaN/GaN до и после gamma-нейтронного облучения с флюенсом 0.4·1014 cм-2.
C.B. Оболенский +4 more
core +1 more source
Proton-Irradiation Effects and Reliability on GaN-Based MIS-HEMTs
A comprehensive study of proton irradiation reliability on a bilayer dielectrics SiNx/Al2O3 MIS-HEMT, the common Schottky gate HEMT, and a single dielectric layer MIS-HEMT with SiNx and with Al2O3 for comparison is conducted in this paper.
Zixin Zhen +4 more
doaj +1 more source
随着高压开关和高速射频电路的发展,增强型GaN基高电子迁移率晶体管(HEMT)成为该领域内的研究热点。增强型GaN基HEMT只有在加正栅压才有工作电流,可以大大拓展该器件在低功耗数字电路中的应用。近年来,国内外对增强型GaN基HEMT阈值电压的研究主要集中以下两个方面: 在材料生长方面,通过生长薄势垒、降低Al组分、生长无极化电荷的 AIGaN/GaN异质材料、生长InGaN或p-GaN盖帽层,来控制二维电子气浓度; 在器件工艺方面,采用高功函数金属、MIS结构、刻蚀凹栅、F基等离子体处理 ...
颜伟 +6 more
core
This paper demonstrates for the first time a monolithically integrated GaN-based voltage-controlled light emitters (HEMT-LED) and photodiodes (PD) on a GaN-on-sapphire platform for on-chip optical interconnect applications.
Lau, Kei May +6 more
core +1 more source
An AlGaN/GaN metal-oxide semiconductor (MOS) high-electron mobility transistor (HEMT) on silicon substrate was obtained with 8 nm Al2O3 gate dielectric films grown using atomic layer deposition.
付 凯 +7 more
core
We report selective growth of AlGaN/GaN high electron mobility transistors (HEMTs) on InGaN/GaN light emitting diodes (LEDs) for monolithic integration of III-nitride HEMT and LED devices (HEMT-LED).
Liu, Chao +4 more
core +1 more source
High-power microwave transistors based on wide-band semiconductors
A review of recent published results on the development of high-power microwave transistors based on AlGaN/GaN heterostructures is presented. The design and manufacturing technology of these transistors are discussed, along with studies of substrate ...
V. I. Bosyi +3 more
doaj

