Results 11 to 20 of about 191 (133)
The current review investigates employing magnetron sputtering techniques to create nanostructured thermal barrier coatings (TBCs) manufactured on the nickel‐based superalloy, Superni 718, which is usually used to manufacture turbine parts that lay under
Syed Faizan Altaf +2 more
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HiPIMS co-sputtering for the increase of the mechanical properties of arc deposited TiN coatings
Relatively few studies have addressed the use of vacuum arc evaporation (VAE) in conjunction with high-power impulse magnetron sputtering (HiPIMS), due to differences in the respective pressure requirements.
Chi-Lung Chang +4 more
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Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS [PDF]
In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5,
Abrão Chiaranda Merij +6 more
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Zinc oxide thin films have been developed through thermal oxidation of Zinc thin films grown by high impulse power magnetron sputtering (HiPIMS). The influence of various sputtering power on thin film structural, morphological, photocatalytic, and ...
Endrika Widyastuti +2 more
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The high power impulse magnetron sputtering (HiPIMS) technique has recently been improved experimentally to deposit titanium films with several short micro-pulses that are decomposed from one single pulse.
Chunqing Huo +4 more
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Magnetron sputter deposition of metal targets over liquids allows producing colloidal solutions of small metal nanoparticles (NPs) without any additional reducing or stabilizing reagents. Despite that this synthetic approach is known for almost 15 years,
Anastasiya Sergievskaya +6 more
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Characterization of SiC thin films deposited by HiPIMS [PDF]
In this work thin films of silicon carbide (SiC) were deposited on silicon wafers by High Power Impulse Magnetron Sputtering (HiPIMS) technique varying the average power of the discharge on a stoichiometric SiC target.
Gabriela Leal +5 more
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Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) [PDF]
High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized.
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Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)? [PDF]
This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated.
K. Strijckmans, F. Moens, D. Depla
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In-Sn-Zn oxide (ITZO) nanocomposite films have been investigated extensively as a potential material in thin-film transistors due to their good electrical properties.
Hui Sun +6 more
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