Results 31 to 40 of about 191 (133)
A Laminating Strategy to Manyfold Enhance the Elastic Stretchability of Stretchable Electronics
Advanced Science, Volume 13, Issue 19, 2 April 2026.We propose a laminating strategy that laminates a thick‐polymer layer onto the thin‐ribbon metallic structure. Using serpentine structures on soft and hard substrates as representative cases, this approach increases elastic stretchability by 3.5‐fold and 2.3‐fold.
Zanxin Zhou +6 more
wiley +1 more source
On the Effect of Aluminum on the Microstructure and Mechanical Properties of CrN Coatings deposited by HiPIMS [PDF]
Materials Research, 2018 Hard coatings are a suitable solution for increasing the lifetime of tools and components employed in different industrial applications. Coatings of transition metal nitrides have great use for tribological applications due to due to their unique ...
Monica Costa Rodrigues Guimarães +6 more
doaj +2 more sources
VacuumThis study examines the two-dimensional (2D) spatial distribution of the ionized flux fraction (IFF) and total flux of sputtered species in a non-reactive high-power impulse magnetron sputtering discharge for a peak current density of ≈1.3 A/cm2. Five magnetic configurations of the magnetron cathode, ranging from highly unbalanced to highly balanced ...
Anna Kapran +3 more
openaire +2 more sources
Rare Metals, Volume 45, Issue 3, March 2026.ABSTRACT Proton exchange membrane fuel cells (PEMFCs) require advanced bipolar plate coatings to enhance efficiency, durability, and commercialization potential. This review presents a systematic framework for evaluating and designing bipolar plate coatings, integrating material selection, performance metrics, deposition techniques, and future ...
Shijie Li +12 more
wiley +1 more source
Advanced Materials Interfaces, Volume 13, Issue 4, 17 February 2026.This study investigates the thermochromic properties of VO2 deposited on aluminum doped zinc oxide precoated fused silica with Al2O3, TiO2, and WO3 as interface layers. The results indicate that the metal‐to‐insulator transition is highly influenced by the grains formed at the interface.
Eduard Llorens Balada, Eugen Stamate
wiley +1 more source
Materials & Design, 2023 Decreasing the growth temperature to lower energy consumption and enable deposition on temperature-sensitive substrates during thin film growth by magnetron sputtering is crucial for sustainable development. High-mass metal ion irradiation of the growing
A.V. Pshyk +5 more
doaj +1 more source
Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) discharge
Journal of Physics: Conference Series, 2008 The ionization mechanism and the temporal behavior of the plasma parameters in a high power impulse magnetron sputtering (HiPIMS) discharge are investigated using a time dependent global (volume averaged) model. The metal ion fraction and the ionized flux fraction are shown to be very high, the sputtered metal is almost fully ionized.
openaire +1 more source
Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges [PDF]
, 2014 Reactive HiPIMS discharges have been investigated by employing a selection of plasma diagnostic techniques. Plasma dynamics in a reactive HiPIMS discharge were studied by means of a single Langmuir probe which revealed electron and positive ion densities of the order of 10^17 to 10^18 m^-3 in typical substrate positions, the temporal evolutions of ...
openaire +1 more source
Vapor Deposition Strategies for Copper‐Based Electrocatalysts in CO2 Reduction Applications
ChemSusChem, Volume 18, Issue 21, Novemebr 4, 2025.This review explores the innovative application of vapor deposition techniques such as physical vapor deposition, chemical vapor deposition, and atomic layer deposition for fabricating copper‐based electrocatalysts for CO2 electrochemical reduction. The advent of copper‐based electrocatalysts has significantly advanced the electrochemical conversion of
Lovelle Rhoy Manpatilan +4 more
wiley +1 more source
physica status solidi (a), Volume 222, Issue 14, July 2025.The average oxidation state of V in AlCrVY(O)N thin films deposited by a hybrid dcMS/HiPIMS method with different O2 flow rates is investigated. X‐ray near‐edge absorption spectroscopy is used to determine the average oxidation states after annealing up to 925 °C.
Eric Schneider +8 more
wiley +1 more source