Results 21 to 30 of about 191 (133)
Corrosion behaviour of multilayer CrN coatings deposited by hybrid HIPIMS after oxidation treatment
Nanotechnology Reviews, 2020 Chromium nitride coatings prepared by physical vapour deposition (PVD) show high hardness, high strength and good thermal conductivity, which makes them useful for cutting and forming tools. In this article, the microstructure and corrosion resistance of
Yu-Jie Zhu +4 more
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Growth of HfN thin films by reactive high power impulse magnetron sputtering
AIP Advances, 2018 Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS).
D. Ö. Thorsteinsson, J. T. Gudmundsson
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Room Temperature Deposition of Nanocrystalline SiC Thin Films by DCMS/HiPIMS Co-Sputtering Technique
Nanomaterials, 2022 Due to an attractive combination of chemical and physical properties, silicon carbide (SiC) thin films are excellent candidates for coatings to be used in harsh environment applications or as protective coatings in heat exchanger applications.
Vasile Tiron +6 more
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Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20
AIP Advances, 2019 We investigate the effect of atomic ordering on the magnetic anisotropy of Ni80Fe20 at.% (Py). To this end, Py films were grown epitaxially on MgO(001) using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS).
Movaffaq Kateb +2 more
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Materials, 2023 We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B2 coatings prepared by the high-power impulse magnetron sputtering technique. We evaluated the influence of pulse duration and substrate bias on the properties of (W,Ta)B2 films.
Rafał Psiuk +7 more
openaire +3 more sources
Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films
Materials & DesignThis study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran +10 more
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Direct metallization of polymers: The HiPIMS effect on early thin film growth
Nano TrendsThe metallization of polymers is essential for developing flexible electronics, yet precise control over metal film growth remains challenging. This study demonstrates the effect of high-power impulse magnetron sputtering (HiPIMS) markedly influencing ...
Kristian A. Reck +10 more
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Beilstein Journal of Nanotechnology, 2019 Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power impulse
Muhammad Taha Sultan +7 more
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Advanced Optical Materials, Volume 14, Issue 16, 24 April 2026.Beyond conventional powders, persistent luminescent thin films and glass‐based composites offer transformative potential for transparent, stable photonic devices. This work evaluates diverse processing routes and structure‐property correlations essential for achieving optical transparency and environmental stability.
Luidgi Giordano +10 more
wiley +1 more source
Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy
Applied Sciences, 2020 Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electronic ...
Aditya Prabaswara +5 more
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