Results 161 to 170 of about 3,871 (202)

Inverse lithography technology at low k1: placement and accuracy of assist features

SPIE Proceedings, 2006
An implementation of inverse lithography technology is studied with special attention to illustrating and analyzing the placement, accuracy, and efficacy of subresolution assist elements. One-dimensional placement through pitch is characterized, and 2D capability is demonstrated for repeated patterns.
Linyong Pang
exaly   +2 more sources

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Proceedings of SPIE, 2008
Mask Error Enhancement Factor (MEEF) plays an increasingly important role in the DFM and RET flow required to continue shrinking designs in the low-k1 lithography regime. The ability to model and minimize MEEF during lithography optimization and RET application is essential to obtain a usable process window (PW).
Thuc Dam, Peter Hu, Bob Gleason
exaly   +2 more sources

Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography

Optics and Laser Technology
Xuan-Ming Duan, Yuan-Yuan Zhao, Jing-Tao Chen   +2 more
exaly   +2 more sources

A Gradient-Based Inverse Lithography Technology for Double-Dipole Lithography

2009 International Conference on Simulation of Semiconductor Processes and Devices, 2009
Resolution enhancement techniques (RETs) have become indispensable for the sub-wavelength optical lithography. Inverse lithography technology (ILT) is one kind of RETs, which attempts to consider the mask synthesis as an inverse problem and compute the optimum mask by using the entire area of the design pattern with a rigorous mathematical approach ...
Wei Xiong, Jinyu Zhang, Yan Wang, Zhiping Yu, Min-Chun Tsai   +4 more
openaire   +2 more sources

Fast inverse lithography technology

SPIE Proceedings, 2006
Many RET technologies, such as rule and model based OPC, the use of sub-resolution assist features, and various PSM methodologies, can be thought of as heuristics employed in an attempt to design improved photomasks. Unfortunately, these traditional approaches are running into severe difficulties at advanced technology nodes (90nm and beyond).
Daniel S. Abrams, Linyong Pang
openaire   +1 more source

Block-based inverse lithography technology with adaptive level-set algorithm

Optics and Laser Technology
Gonzalo R. Arce, Shengen Zhang, Xu Ma
exaly   +2 more sources

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

ECS Transactions, 2010
For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang, Danping Peng, Peter Hu, Dongxue Chen, Tom Cecil, Lin He, Guangming Xiao, Vikram Tolani, Thuc Dam, KiHo Baik, Bob Gleason   +10 more
openaire   +1 more source

Inverse lithography technology at chip scale

SPIE Proceedings, 2006
In this paper we describe, from the user's point of view, how Inverse Lithography Technology (ILT) differs from Optical Proximity Correction (OPC). We discuss some specifics of ILT at chip-scale. We show simulation and experimental results from 90nm and 65nm semiconductor nodes, comparing results from ILT-generated masks and OPC-generated masks for ...
Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang   +10 more
openaire   +1 more source

Hot-Spots Aware Inverse Lithography Technology

ECS Transactions, 2009
This paper presents a new method of Inverse Lithography Technology (ILT) to accelerate its optimization process and convergence, which involves two steps in iteration: the first step is to find hot-spots in the layout in the optimization process and the second step is to optimize on the hot-spot areas.
Yiwei Yang, Zheng Shi, Shanhu Shen, Chunlei Xie   +3 more
openaire   +1 more source

GMUNet-ILT: A lightweight MLP-based network for Inverse Lithography Technology

2025 International Symposium of Electronics Design Automation (ISEDA)
Dawei Gao, Yongyu Wu, Zebang Lin
exaly   +2 more sources