Results 11 to 20 of about 243,893 (286)
Dry etching and sputtering [PDF]
, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
core +2 more sources
ELABORATION OF THE PLATFORM FOR FLEXOELECTRIC INVESTIGATION OF GaN MICROTUBES [PDF]
Journal of Engineering Science (Chişinău), 2020 In this paper, the design and elaboration of a cost-effective technological process for the fabrication of the platform for the study of flexoelectric properties of GaN microtubes with the diameter of 2 - 5 μm and the thickness of the microtube walls of ...
MONAICO, Elena +3 more
doaj +1 more source
Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching
Micromachines, 2020 This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching
Lihao Wang +6 more
doaj +1 more source
Overhang Saddle Fin Sidewall Structure for Highly Reliable DRAM Operation
IEEE Access, 2023 A novel memory cell transistor structure based on a saddle fin-based DRAM is presented for highly reliable operations. The overhang saddle fin (oss-fin) active structure is formed by two steps of etching of the fin; isotropic etching for the short side ...
Jin-Woo Han +3 more
doaj +1 more source
ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]
, 2010 The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
core +1 more source
Giant Direct Magnetoelectric Effect in Nanocomposite CoFe<sub>2</sub>O<sub>4</sub>:PVDF-TrFE Thin Films. [PDF]
Adv Sci (Weinh)A novel three‐step grow‐etch‐fill fabrication approach creates structured cobalt ferrite/ferroelectric polymer nanocomposites with high interfacial areas. Driven by efficient strain‐mediated coupling, this crystalline system achieves a giant room‐temperature magnetoelectric coefficient nearly two orders of magnitude higher than other CFO/PVDF‐TrFE thin
de H-Óra M +8 more
europepmc +2 more sources
naitsok/ultimate-psi-etching: Ultimate PSi Etching 2.0.2.5
, 2022 A NI LabVIEW-based software for electrochemical anodization of Si wafers. Features: Preistalled etching cells. Three different etching regimes: constant current, pulsed etching, and non-linear current. Preinstalled wafer liftoff pulses.
Konstantin Tamarov
core +1 more source
On large bending deformations of transversely isotropic rectangular elastic blocks [PDF]
, 2007 In this paper we examine the classical problem of finite bending of a rectangular block of elastic material into a sector of a circular cylindrical tube in respect of compressible transversely isotropic elastic materials.
Kassianidis , Fotios +3 more
core +1 more source
RESEARCH PROCESS PLASMA ETCHING SIO2 MEMBRANE
Вестник Дагестанского государственного технического университета: Технические науки, 2016 The article discusses the results of plasma chemical etching of silicon dioxide in the fluorine-containing medium in the manufacture of semiconductor devices.
T. A. Ismailov +3 more
doaj +1 more source
Preparation of small silicon carbide quantum dots by wet chemical etching [PDF]
, 2013 Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Szekrényes, Zsolt +5 more
core +1 more source