Results 51 to 60 of about 3,739 (202)

Field and charge distribution in the junction between n-GaAs and semiinsulating chrome doped substrate

open access: yesФизика волновых процессов и радиотехнические системы, 2013
Field and volume charge structure in the junction between semiinsulating chrome doped substrate and n-channel of GaAs MESFET was analyzed by means of a computational modeling. It was used a four-level model of semiinsulating GaAs with deep levels.
A.M. Bobreshov   +2 more
doaj  

Semiconductor Membrane Exfoliation: Technology and Application

open access: yesAdvanced Electronic Materials, Volume 11, Issue 1, January 2025.
This review systematically outlines diverse technical strategies commonly employed by the scientific community to achieve exfoliation‐transfer of semiconductor structures from conventional rigid substrates. Simultaneously, it also highlights the potential of membrane through various exfoliation‐transfer methods in multifunctional (opto)electronic ...
Hongliang Chang   +7 more
wiley   +1 more source

Recent Advanced Ultra‐Wide Bandgap β‐Ga2O3 Material and Device Technologies

open access: yesAdvanced Electronic Materials, Volume 11, Issue 1, January 2025.
The advanced ultra‐wide bandgap semiconductor material β‐Ga2O3 is highly favored for its exceptional material properties. This sudy provides a comprehensive review of its developments in areas such as materials, power devices, and RF devices. The current status of its commercialization process is outlined, along with an analysis of the challenges it is
Sihan Sun   +5 more
wiley   +1 more source

AlGaN/GaN Dual‐Gate HEMT Using a High Al Mole Fraction and Thin Barrier Layer

open access: yesElectronics Letters, Volume 61, Issue 1, January/December 2025.
This article examines the use of a high Al mole fraction (x = 0.34) and a thin barrier layer (t = 11.5 nm) in AlGaN/GaN high electron mobility transistors (HEMTs) with both single‐gate and dual‐gate configurations. Single‐gate HEMTs with the current epitaxial structure demonstrated an improved maximum drain current and transconductance, as well as ...
Yuji Ando   +4 more
wiley   +1 more source

A Comparison Between GaAs Mesfet and Si NMOS ESD Behaviour

open access: yesActive and Passive Electronic Components, 1987
Work is in hand at Loughborough University to investigate and compare the ESD sensitivity of GaAs D-MESFETs and unprotected enhancement mode NMOS structures.
A. J. Franklin   +2 more
doaj   +1 more source

Recent progress on heteroepitaxial growth of single crystal diamond films

open access: yesElectron, Volume 2, Issue 4, November 2024.
Diamond exhibits exceptional semiconductor properties across diverse applications. Heteroepitaxial growth offers a route to diamond wafers via chemical vapor deposition. By exploiting the lattice matching to minimize interfacial strain, iridium substrates enable scalable growth of high‐quality single‐crystal diamond films suitable for power electronics,
Vedaste Uwihoreye   +5 more
wiley   +1 more source

A Low-Power Enable/Disable GaAs MESFET Differential Logic

open access: yes, 2007
In this work, a novel and straightforward Enable/Disable GaAs MESFET Differential Logic (EMDL) structure is presented. EMDL is compatible with DCFL and some reported MESFET differential logic families, like DPTL, DCVS and DC 2 FL.
Mesfet Differential, Ribas Bernal
core  

Optically controlled GaAs dual-gate MESFET and permeable base transistors [PDF]

open access: yes, 1986
Optically induced voltage and dc characteristics of the GaAs Dual-gate MESFET and the Permeable Base Transistor (PBT) with optical illumination at wavelength below 0.87 microns were obtained and compared with GaAs MESFET.
Simons, R. N., Bhasin, K. B.
core  

Active inductances controlled in GaAs MESFET technology [PDF]

open access: yes, 2006
Two new structures of active inductance which implement MESFET transistors are proposed in this article. The technological parameters of the components of “inductances” are those of 0.8 µm MESFET technology.
Benbouza, M.S.   +4 more
core   +2 more sources

Schottky Diode Leakage Current Fluctuations: Electrostatically Induced Flexoelectricity in Silicon

open access: yesAdvanced Science, Volume 11, Issue 38, October 16, 2024.
Electrostatic attractive forces between a Pt atomic force microscopy (AFM) tip and an oxide‐free silicon surface lead to a strain gradient in the semiconductor, which results in a flexoelectric junction voltage. Flexoelectricity increases diode leakage and shifts the Schottky junction knee voltage away from the origin, accounting for parasitic effects ...
Carlos Hurtado   +3 more
wiley   +1 more source

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