Results 231 to 240 of about 50,856 (266)

P-N Nanoporous Silicon Fabrication Using Photoelectrochemical Etching and Ultrasonic Vibration and Liquid-Phase Bonding for Optoelectronic Applications. [PDF]

Micromachines (Basel)
Chiang CC, Immanuel PN.
europepmc   +1 more source

CVD-Engineered Nano Carbon Architectures: Mechanisms, Challenges, and Outlook. [PDF]

Nanomaterials (Basel)
Hasan M, Abrahamczyk S, Awan MA, Sakreida O, Bachmatiuk A, Simha Martynková G, Čech Barabaszová K, Rümmeli MH.   +7 more
europepmc   +1 more source

Meta-analyses of the evolution of MXene synthesis for bioengineering and artificial intelligence-driven applications. [PDF]

Commun Mater
Saleth LR, Gupta M, Sharma G, Verma E, Dhingra S.   +4 more
europepmc   +1 more source

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Metal Assisted Chemical Etch of Polycrystalline Silicon

Journal of Micro- and Nano-Manufacturing, 2022
Abstract Metal-assisted chemical etching (MacEtch) of silicon shows reliable vertical anisotropic wet etching only in single-crystal silicon, which limits its applications to a small number of devices. This work extends the capabilities of MacEtch to polysilicon which has potential to enable high-volume and cost-sensitive applications ...
Crystal Barrera, Paras Ajay, Akhila Mallavarapu, Mark Hrdy, S. V. Sreenivasan   +4 more
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Silicon Vias Fabricatied by Metal-Assisted Chemical Etching

2020 21st International Conference on Electronic Packaging Technology (ICEPT), 2020
As a bulk micromachining technology, the metal assisted chemical etching (MACE) is attractive for the application of silicon via fabrication, which is an important technology to realize the 3D stacked chip electrical interconnection in integrated circuit. In this paper, silver is used as catalyst to make an anisotropic wet etching of silicon bulk.
Hongbo Xu, Jianqiang Wang, Hongyun Zhao, Mingyu Li   +3 more
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Metal-assisted chemical etching of molybdenum disulphide

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 2015
Large-scale two-dimensional (2D) electronics requires lithographic patterning of molybdenum disulphide (MoS2) into various nanostructures for device integration. However, fabrication of MoS2 nanostructures with well-defined edges remains challenging.
Wei Sun Leong, John T.L. Thong
openaire   +1 more source

Bulk Micromachining of Si by Metal‐assisted Chemical Etching

Small, 2014
Bulk micromachining of Si is demonstrated by the well‐known metal‐assisted chemical etching (MaCE). Si microstructures, having lateral dimension from 5 μm up to millimeters, are successfully sculpted deeply into Si substrate, as deep as >100 μm.
Sang-Mi, Kim, Dahl-Young, Khang
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Vertical etching with isolated catalysts in metal-assisted chemical etching of silicon

Nanoscale, 2012
Metal assisted chemical etching with interconnected catalyst structures has been used to create a wide array of organized nanostructures. However, when patterned catalysts are not interconnected, but are isolated instead, vertical etching to form controlled features is difficult.
Lianto, P., Yu, S., Wu, J., Thompson, C.V., Choi, W.K.   +4 more
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