Results 11 to 20 of about 75,173 (277)
The formation of CaSi2 films on Si(111) with the molecular-beam epitaxy (MBE) of CaF2 under fast electron-beam irradiation was investigated. The method of a high-planarity CaSi2 film synthesis assisted by electron-beam irradiation was developed.
Anatoly V. Dvurechenskii +6 more
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GaAs Molecular Beam Epitaxy on (110)-Oriented Substrates
Molecular-beam epitaxial growth of Si-doped GaAs single-crystal layers on (110)-oriented GaAs substrates has been studied. The surface morphology of grown films was analyzed by scanning electron microscopy and atomic force microscopy, and the crystal ...
Evgeniy Klimov +9 more
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Self-regulated growth of [111]-oriented perovskite oxide films using hybrid molecular beam epitaxy
Exotic material properties and topological nontrivial surface states have been theoretically predicted to emerge in [111]-oriented perovskite layers. The realization of such [111]-oriented perovskite superlattices has been found challenging, and even the
Joseph Roth +5 more
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Geometrical Selection of GaN Nanowires Grown by Plasma-Assisted MBE on Polycrystalline ZrN Layers
GaN nanowires grown on metal substrates have attracted increasing interest for a wide range of applications. Herein, we report GaN nanowires grown by plasma-assisted molecular beam epitaxy on thin polycrystalline ZrN buffer layers, sputtered onto Si(111)
Karol Olszewski +5 more
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Hybrid molecular beam epitaxy of germanium-based oxides
Germanium-based oxides are wide bandgap semiconductors with the prospects of ambipolar doping. Here, a hybrid molecular beam epitaxy is demonstrated for the growth of both rutile Sn1-x Ge x O2 and perovskite SrSn1-x Ge x O3 films.
Fengdeng Liu +8 more
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Observation of confined propagation in Bragg waveguides [PDF]
A new type of waveguiding in a slab dielectric bounded on one side by air and on the other by a periodic layered medium (grown by molecular beam epitaxy) has been ...
Cho, A. Y., Yariv, A., Yeh, P.
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Silicon Molecular Beam Epitaxy [PDF]
Many works are now conducted in the worldwide scale on silicon molecular beam epitaxy (Si MBE) including homoepitaxy, doping, heteroepitaxy such as silicon/insulator, silicon/other semiconductor, and silicon/metal (silicide), and poly-Si deposition. As for device applications, work is now moving from conventional discrete devices to integrated circuits
openaire +2 more sources
Molecular Beam Epitaxy Growth of Quantum Wires and Quantum Dots
Molecular beam epitaxy technology has a significant advantage in semiconductor technology due to its strong controllability, especially for the preparation of materials such as quantum wires and quantum dots [...]
Xiaohui Li, Qian Xu, Ziyang Zhang
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A new model for nanowire growth by molecular beam epitaxy is proposed which extends the earlier approaches treating an isolated nanowire to the case of ensembles of nanowires.
Vladimir G. Dubrovskii
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Molecular beam epitaxy of InAs nanowires in SiO2 nanotube templates: challenges and prospects for integration of III-Vs on Si [PDF]
Guided growth of semiconductor nanowires in nanotube templates has been considered as a potential platform for reproducible integration of III-Vs on silicon or other mismatched substrates.
Dubrovskii, Vladimir G. +8 more
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