Results 91 to 100 of about 421 (134)

Transferring Optical Proximity Correction (OPC) Effect into Optical Mode

8th International Symposium on Quality Electronic Design (ISQED'07), 2007
Because of the ever-decreasing feature size in modern photolithography, the complexity of pattern increases dramatically and tape-out time becomes prolonged. It is desirable to transfer OPC process into optical model for the sake of time. In this report, we introduce a novel method of calculating the OPC effect by modifying the optical model, which is ...
Lawrence S Melvin, Jianliang Li
exaly   +2 more sources

A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation

Proceedings of the 2016 Design, Automation & Test in Europe Conference & Exhibition (DATE), 2016
Aggressive Optical Proximity Correction (OPC) has been widely adopted in optical lithography to preserve circuit performance for sub-20nm technology nodes. However, complex mask patterns are output resulting in lower mask manufacturability and large computational time.

exaly   +3 more sources

Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

SPIE Proceedings, 2002
Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to ...
Soichi Inoue, Sachiko Kobayashi, Toshiya Kotani   +2 more
exaly   +2 more sources

Line end optimization through optical proximity correction (OPC): a case study

SPIE Proceedings, 2006
Device performance is highly associated with the line end performance of critical layers. Poly line end shortening (LES) or bridging can result in leakage or short circuit. Model-based optical proximity correction (OPC) prioritized to fit one-dimensional pitch structures can also improve two-dimensional line end performance.
Dyiann Chou, Ken McAllister
exaly   +2 more sources

Fabrication and pattern transfer of optical proximity correction (OPC) mask

SPIE Proceedings, 1994
An application of a mask with serif patterns to a 0.8 micrometers rule mask ROM programming layer is discussed. A serif pattern is the unprinting size pattern added to the corner of original pattern. It suppresses the corner rounding caused by the lack of resolution performance of a lithography exposure system.
Yoshihiro Todokoro, Hisashi Watanabe
exaly   +2 more sources

Full-depth optical proximity correction (FD-OPC) based on E-D forest

SPIE Proceedings, 1999
When the k 1 number approaches 0.6 and below, optical proximity correction (OPC) is inevitable. Most existing OPC schemes correct the image in the focal planes without considering the possibility of different optimum focuses for the features to be corrected.
Burn J. Lin, Peter Young
exaly   +2 more sources

P-79: New Applications of Optical Proximity Correction (OPC) Technology in the Display Industry

Digest of Technical Papers SID International Symposium
This article introduces two new application cases of Optical Proximity Correction (OPC) technology in display backboards. The first method is to use OPC technology on the mask template layout to solve the Mura defect problem caused by diffraction induced exposure increase during the splicing process of the Over Coat (OC) layer mask template.
Jing Wang, Chunyang Wang, Jing Yang, Ran Li, Zheng Liu   +4 more
exaly   +2 more sources

Neural networks application for OPC (optical proximity correction) in mask making

Microelectronic Engineering, 1996
Abstract In this paper a neural network method for optical proximity correction is presented. A non linear two-dimensional spatial inverse filter is proposed as deconvolutional factor over pattern plane. Test sets for the different correction strategies were prepared. Boltzmann machine neural network for training set preparation is proposed.
exaly   +2 more sources

Advanced Optical Proximity Correction (OPC) Techniques in Computational Lithography: Addressing the Challenges of Pattern Fidelity and Edge Placement Error

Global Journal of Medical Case Reports, 2022
Preethish Nanan Botlagunta, Subrahmanyasarma Chitta   +1 more
exaly   +2 more sources

TIP-OPC: a new topological invariant paradigm for pixel based optical proximity correction

IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, 2007
David Z Pan
exaly   +3 more sources