Results 111 to 120 of about 421 (134)
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SPIE Proceedings, 2002
We develop a Mask Process Correction (MPC) set of tools in collaboration with DuPont Photomasks, Mentor Graphics and CEA-LETI. The MPC project consists of 3 modules.
Alexandra Barberet +5 more
openaire +1 more source
We develop a Mask Process Correction (MPC) set of tools in collaboration with DuPont Photomasks, Mentor Graphics and CEA-LETI. The MPC project consists of 3 modules.
Alexandra Barberet +5 more
openaire +1 more source
1996 Symposium on VLSI Technology. Digest of Technical Papers, 2002
A 5.01-/spl mu/m/sup 2/ full-CMOS SRAM cell using a 0.28-/spl mu/m design rule has been developed and the cell operation at as low as 0.6 V was confirmed. This cell has been designed not only to be small but also to be widened bitline pitch for reduction of bitline delay.
M. Ueshima +8 more
openaire +1 more source
A 5.01-/spl mu/m/sup 2/ full-CMOS SRAM cell using a 0.28-/spl mu/m design rule has been developed and the cell operation at as low as 0.6 V was confirmed. This cell has been designed not only to be small but also to be widened bitline pitch for reduction of bitline delay.
M. Ueshima +8 more
openaire +1 more source
Applied Optics
Optical proximity correction (OPC) is a pivotal resolution enhancement technique that compensates for the image distortion in the optical lithography process. However, the turn-around time of modern OPC techniques, namely model-based OPC (MBOPC), increases dramatically as the lithography technology node constantly pushes forward.
Jingqing Liu, Xu Ma
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Optical proximity correction (OPC) is a pivotal resolution enhancement technique that compensates for the image distortion in the optical lithography process. However, the turn-around time of modern OPC techniques, namely model-based OPC (MBOPC), increases dramatically as the lithography technology node constantly pushes forward.
Jingqing Liu, Xu Ma
openaire +2 more sources
Optical proximity correction (OPC) methods and methods of manufacturing masks using the OPC methods
2021YEO SANGCHUL, CHOI NARAK
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Improvement of YX42° Cut LiTaO3 SAW Filters with Optical Proximity Effect Correction Method
Micromachines, 2023Xing Han, Yushuai Liu
exaly
Etch proximity correction by integrated model-based retargeting and OPC flow
Proceedings of SPIE, 2007Yuri Granik +2 more
exaly
Optical Proximity Correction With Linear Regression
IEEE Transactions on Semiconductor Manufacturing, 2008Avideh Zakhor
exaly
Automatic optical proximity correction (OPC) rule generation
2004SHI XUELONG, CHEN JANG FUNG
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Net-voltage-aware optical proximity correction (OPC)
2016BANERJEE SHAYAK +2 more
openaire +1 more source