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Stray-light implementation in optical proximity correction (OPC)
SPIE Proceedings, 2007It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect.
Young-Chang Kim +11 more
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Aggressive Optical Proximity Correction (OPC) has been widely adopted in optical lithography to preserve circuit performance for sub-20nm technology nodes. However, complex mask patterns are output resulting in lower mask manufacturability and large computational time.
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Transferring Optical Proximity Correction (OPC) Effect into Optical Mode
8th International Symposium on Quality Electronic Design (ISQED'07), 2007Because of the ever-decreasing feature size in modern photolithography, the complexity of pattern increases dramatically and tape-out time becomes prolonged. It is desirable to transfer OPC process into optical model for the sake of time. In this report, we introduce a novel method of calculating the OPC effect by modifying the optical model, which is ...
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Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to ...
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