Results 81 to 90 of about 380 (120)

Flexible ensheathment of axons enables myelination of complex CNS networks. [PDF]

open access: yesNature
Call CL   +10 more
europepmc   +1 more source

12-Spin-Qubit Arrays Fabricated on a 300 mm Semiconductor Manufacturing Line. [PDF]

open access: yesNano Lett
George HC   +31 more
europepmc   +1 more source

A deep phenotyping study in mouse and iPSC models to understand the role of oligodendroglia in optic neuropathy in Wolfram syndrome. [PDF]

open access: yesActa Neuropathol Commun
Ahuja K   +27 more
europepmc   +1 more source
Some of the next articles are maybe not open access.

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Stray-light implementation in optical proximity correction (OPC)

SPIE Proceedings, 2007
It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect.
Young-Chang Kim   +11 more
openaire   +3 more sources

A Fast Manufacturability Aware Optical Proximity Correction (OPC) Algorithm with Adaptive Wafer Image Estimation

Proceedings of the 2016 Design, Automation & Test in Europe Conference & Exhibition (DATE), 2016
Aggressive Optical Proximity Correction (OPC) has been widely adopted in optical lithography to preserve circuit performance for sub-20nm technology nodes. However, complex mask patterns are output resulting in lower mask manufacturability and large computational time.
Ahmed Awad 0002   +2 more
openaire   +4 more sources

Transferring Optical Proximity Correction (OPC) Effect into Optical Mode

8th International Symposium on Quality Electronic Design (ISQED'07), 2007
Because of the ever-decreasing feature size in modern photolithography, the complexity of pattern increases dramatically and tape-out time becomes prolonged. It is desirable to transfer OPC process into optical model for the sake of time. In this report, we introduce a novel method of calculating the OPC effect by modifying the optical model, which is ...
Jianliang Li   +2 more
openaire   +3 more sources

Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

SPIE Proceedings, 2002
Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to ...
Toshiya Kotani   +5 more
openaire   +3 more sources

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