Results 101 to 110 of about 6,644,773 (301)

Generating Unconventional Spin‐Orbit Torques With Patterned Phase Gradients in Tungsten Thin Films

open access: yesAdvanced Materials, EarlyView.
ABSTRACT A key aim in spintronics is to achieve current‐induced magnetization switching via spin‐orbit torques without external magnetic fields. For this, the focus of recent work has been on introducing controlled lateral gradients across ferromagnet/heavy‐metal devices, giving variations in thickness, composition, or interface quality.
Lauren J. Riddiford   +9 more
wiley   +1 more source

Isotropic plasma atomic layer etching of Al2O3

open access: yes, 2020
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)".
Chittock, Nicholas J.   +2 more
core   +1 more source

Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions

open access: yesScientific Reports
In the semiconductor manufacturing process, when conducting inductively coupled plasma-reactive ion etching in challenging environments, both wafers and the ceramic components comprising the chamber’s interior can be influenced by plasma attack.
Ho Jin Ma   +8 more
doaj   +1 more source

Unveiling Exsolution‐Induced Giant Electronic and Magnetic Property Changes in Non‐Stoichiometric Titanate Perovskite Thin Films

open access: yesAdvanced Materials, EarlyView.
A giant insulator to metal transition and emergent superparamagnetism are revealed by nanoparticle exsolution in non‐stoichiometric titanate perovskite thin films. By combining transport, synchrotron spectroscopy, and first‐principles calculations, this work reveals how defect reconfiguration and lattice reconstruction fundamentally reshape electronic ...
Sungil Kim   +11 more
wiley   +1 more source

Amorphous Hydrogenated Carbon Etching with a Low Energetic Plasma Jet [PDF]

open access: yes, 2009
Structures in the chip industry are approaching the 32 nm half pitch, which requires radiation in the VUV and EUV range. Cracking of hydrocarbon impurities in the vacuum by the radiation causes C growth on the VUV and EUV optics.
Engeln, RAH Richard   +5 more
core   +1 more source

Methods of removing polymer contamination caused by plasma-chemical etching

open access: yesТехнологія та конструювання в електронній апаратурі, 2003
The formation of small-sized contact windows by plasma-chemical etching and the main factors of polymer residue formation after etching are considered. The composition of polymer residues and the mechanism of their removal by chemical methods using PRX ...
A. E. Ivanchikov   +5 more
doaj  

Effect of sample thickness on etching rate: Simulations and experiments

open access: yesJournal of the European Optical Society-Rapid Publications
Precision optical elements such as computer generated holograms (CGH) for optical testing or optical elements for high-power lasers, e.g., pulse compression gratings, are often many millimeters thick.
Savchenko Anton   +3 more
doaj   +1 more source

Phase Engineering of Nanomaterials (PEN): Evolution, Current Challenges, and Future Opportunities

open access: yesAdvanced Materials, EarlyView.
This review summarizes the synthesis, phase transition, advanced characterization spanning ex situ to in situ and operando techniques, and diverse applications of phase engineering of nanomaterials (PEN). It further outlines key challenges and future opportunities, such as phase stability, architecture control, and artificial intelligence (AI)‐driven ...
Ye Chen   +7 more
wiley   +1 more source

Scalable Crackle-Lithography for Multifunctional Enclosed Plastic Nanofluidic Devices. [PDF]

open access: yesAdv Sci (Weinh)
Crackle‐lithography enables scalable fabrication of enclosed plastic‐substrate‐based nanofluidic devices with interconnected nanochannels that enable molecular transport, optical interrogation, confined electroless copper deposition, and ionic memristive behavior.
Dumpala TR   +8 more
europepmc   +2 more sources

Polyphenol‐Inspired Materials for Agricultural Applications

open access: yesAdvanced Materials, EarlyView.
This review outlines the use of polyphenol‐inspired materials for sustainable agriculture, highlighting their molecular design, interfacial assembly, structure–property relationships, and prospects toward precision agriculture, climate resilience, ecosystem protection, and circular bioeconomy strategies.
Haofu Liu   +8 more
wiley   +1 more source

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