Results 91 to 100 of about 1,458,991 (299)
Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
, 2022 S.98-102The authors report on the investigation of mechanisms involved in the reactive ion etching of InP and related compounds by in situ determination of plasma species using mass spectroscopy.
Schmid, H.
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n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz
Advanced Materials, EarlyView.Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis +19 more
wiley +1 more source
Micro and Nano Engineering, 2018 Cryogenic plasma deep-etching for silicon sub-micron structures was studied with the use of modified poly(styrene) (PS) perforated masks obtained from laterally phase separated PS and poly (lactic acid) PLA blend thin films.
M. Kulsreshath +7 more
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Silicon flower structures by maskless plasma etching. [PDF]
Heliyon, 2023 Zhao G +6 more
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Advanced Materials, EarlyView.Anion‐exchange doping of conjugated polymers is an effective way to achieve high conductivities. Here, we report over 2000 S cm−1 electrical conductivity for doped P(g3BTTT). In addition, we show that P(g3BTTT) sustains exceptionally high doping levels without any drop in the charge mobility.
Basil Hunger +14 more
wiley +1 more source
Density wave like transport anomalies in surface doped Na2IrO3
AIP Advances, 2017 We report that the surface conductivity of Na2IrO3 crystal is extremely tunable by high energy Ar plasma etching and can be tuned from insulating to metallic with increasing etching time.
Kavita Mehlawat, Yogesh Singh
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There is a high demand for plasma-resistant coatings that prevent the corrosion of the internal ceramic components of plasma etching equipment, thereby reducing particle contamination and process drift.
Kaiqu Ang +8 more
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Inductively coupled plasma dry etching process on planar lightwave circuit fabrication / Chuah Khoon Seah [PDF]
, 2010 The main objective of this project is to master state-of-the-art techniques and knowledge in silica etching in order to achieve high quality waveguide circuit on Planar Lightwave Circuit devices.
Chuah, Khoon Seah
core
Leaftronics: Bio‐Fractal Scaffolds From Leaf Venation for Low‐Waste Electronics
Advanced Materials, EarlyView.“Leaftronics” transforms naturally evolved leaf venation into quasi‐fractal scaffolds for sustainable electronics. Polymer‐infiltrated leaf skeletons can be used to fabricate ultra‐smooth, reflow‐ and thin‐film‐compatible decomposable substrates, while making the same lignocellulose networks conducting results in flexible transparent electrodes.
Rakesh Rajendran Nair +3 more
wiley +1 more source
Plasma-chemical etching of gallium nitride epitaxial structures
Технологія та конструювання в електронній апаратурі, 2005 The results of plasma-chemical etching of gallium nitride epitaxial structures on sapphire substrates are presented. Etching was carried out in a plasma-chemical reactor with closed electron drift.
A. G. Borisenko +5 more
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