Results 71 to 80 of about 2,786,485 (335)

Analysis of Current Research Status of Plasma Etch Process Model

open access: yesJournal of Microelectronic Manufacturing, 2018
This paper summarizes the status of the plasma etch process modeling research. It mainly introduces typical etching models employing the analytical method, geometric method, system identification method, basic principle simulation method, as well as ...
Xiaoting Li   +8 more
doaj   +1 more source

High aspect ratio silicon dioxide-coated single-walled carbon nanotube scanning probe nanoelectrodes [PDF]

open access: yes, 2009
We have fabricated high aspect ratio, hydrophilic nanoelectrodes from individual single-walled carbon nanotubes (SWNTs) mounted on conductive atomic force microscope (AFM) tips for use as electrochemical probes.
Ceres, Donato M.   +4 more
core   +2 more sources

Auto‐Generated Valence States in Electrocatalysts for Boosting Oxygen and Hydrogen Evolution Kinetics in Alkaline Water/Alkaline Seawater/Simulated Seawater/Natural Seawater

open access: yesAdvanced Functional Materials, EarlyView.
This review systematically highlights the latest achievements in mixed‐valence states relevant to hydrogen and oxygen evolution reactions, providing essential insights into future directions and methods for large‐scale practical implementation. This critical review is expected to provide an overview of recent advancements in diverse valence‐state metal
Jitendra N. Tiwari   +4 more
wiley   +1 more source

Characterization of Hydrogen Plasma Defined Graphene Edges

open access: yes, 2019
We investigate the quality of hydrogen plasma defined graphene edges by Raman spectroscopy, atomic resolution AFM and low temperature electronic transport measurements.
Giessibl, Franz J.   +10 more
core   +1 more source

Micromachining of buried micro channels in silicon [PDF]

open access: yes, 2000
A new method for the fabrication of micro structures for fluidic applications, such as channels, cavities, and connector holes in the bulk of silicon wafers, called buried channel technology (BCT), is presented in this paper.
Berenschot, J.W. (Erwin)   +7 more
core   +3 more sources

A Surface‐engineered Microfluidic Device for Antibody‐Mediated Negative Selection of High‐Quality Sperm for Assisted Reproduction

open access: yesAdvanced Functional Materials, EarlyView.
This study reports a microfluidic device with a functionalized surface utilizing a polyoxazoline coating and covalently immobilized gold nanoparticles and anti‐phosphatidylserine antibody. The device efficiently eliminates pre‐apoptotic and apoptotic spermatozoa and yields sperm with substantially improved quality and low DNA damage, offering a simple ...
Soraya Rasi Ghaemi   +5 more
wiley   +1 more source

Fabrication of air bridges on (100) β-Ga2O3 using crystallographic HCl gas etching

open access: yesAIP Advances
β-Ga2O3 air bridges on (100) substrates were fabricated through a self-aligning process that used conventional anisotropic BCl3/Ar-plasma etching and crystallographic plasma-free HCl gas ...
Takayoshi Oshima, Yuichi Oshima
doaj   +1 more source

Transfer of micron pattern with reactive atmospheric plasma jets into fused silica

open access: yesApplied Surface Science Advances
Pattern transfer by plasma etching is a traditional standard technology in microelectronics and other micron technologies. These technologies require vacuum conditions, which limit throughput, size, and low-cost fabrication.
Martin Ehrhardt   +5 more
doaj   +1 more source

Shaping Ti3C2 MXene Nanospheres for Precision Near‐Infrared Photothermal Therapy

open access: yesAdvanced Functional Materials, EarlyView.
In this study, we report producing spherical MXenes via fs laser fragmentation of Ti3C2 flakes in liquid medium. The nanoparticles demonstrated pronounced light absorption and high photothermal conversion efficiencies of 68% and 63% under heating with NIR‐I and NIR‐II lasers, respectively.
Julia S. Babkova   +21 more
wiley   +1 more source

Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps

open access: yes, 2017
In this paper, a new route for a selective deposition of thin oxide by atomic layer deposition is discussed. The proposed process is using super cycles made of an additional plasma etching step in a standard plasma enhanced atomic layer deposition (PEALD)
Rémi Vallat   +3 more
semanticscholar   +1 more source

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