Results 51 to 60 of about 27,823 (260)
Analysis of Current Research Status of Plasma Etch Process Model
This paper summarizes the status of the plasma etch process modeling research. It mainly introduces typical etching models employing the analytical method, geometric method, system identification method, basic principle simulation method, as well as ...
Xiaoting Li +8 more
doaj +1 more source
The intrinsic distortion‐rich lattice of HEPBA with GQD‐enabled microstrain engineering establishes a mechanistic route toward high‐performance alkaline hydrogen evolution reaction. HEPBA inherently feature heterogeneous local coordination environments arising from multimetal incorporation, while properly introducing GQD during coprecipitation ...
Mia Rinawati +10 more
wiley +1 more source
Fabrication of air bridges on (100) β-Ga2O3 using crystallographic HCl gas etching
β-Ga2O3 air bridges on (100) substrates were fabricated through a self-aligning process that used conventional anisotropic BCl3/Ar-plasma etching and crystallographic plasma-free HCl gas ...
Takayoshi Oshima, Yuichi Oshima
doaj +1 more source
Transfer of micron pattern with reactive atmospheric plasma jets into fused silica
Pattern transfer by plasma etching is a traditional standard technology in microelectronics and other micron technologies. These technologies require vacuum conditions, which limit throughput, size, and low-cost fabrication.
Martin Ehrhardt +5 more
doaj +1 more source
Yttrium doping in Sb‐alloyed BiSe synergistically induces Bi vacancies and flattens conduction bands, simultaneously slashing lattice thermal conductivity by 50% and boosting the power factor. The optimized n‐type Bi0.64Sb0.3Y0.06Se delivers a peak zT of 0.91 at 393 K (average zT 0.76, 300–523 K) and an 8‐pair module with 4.6% conversion efficiency ...
Wenhao Xie +16 more
wiley +1 more source
Multimode Oxide‐Based Optoelectronic Memtransistor for In‐Sensor Vision Processing
A multimode optoelectronic memtransistor (OEMT) is demonstrated for vision explainable artificial intelligence (VXAI) hardware. By integrating optical sensing, electrical masking, and non‐volatile memory, the device enables key operations required for generating saliency information.
Min Gu Lee +10 more
wiley +1 more source
Impact of Ar/CF4 Mixed Gas Flow Rate on Silicon Etching Using Surface Discharge Plasma
This study examines the effects of varying argon (Ar) and carbon tetrafluoride (CF4) gas flow rates on the etching of monocrystalline silicon substrates using surface discharge plasma.
Toshiyuki Hamada +2 more
doaj +1 more source
In this work, diamonds with negative charged silicon‐vacancy (SiV−) centers have been designed for use as thermometers in biomedical applications. Multiparametric analysis of the emission characteristics of the SiV− centers provides extraordinary sensitivity for temperature detection in the physiological temperature range.
María Gragera +6 more
wiley +1 more source
Evolution of surface morphology and properties of diamond films by hydrogen plasma etching
The micron-scale diamond film was prepared using hydrogen and methane as the mixed gas supplies via self-developed 3 kW/2,450 MHz microwave plasma chemical vapor deposition (MPCVD) equipment.
Chu Genjie +5 more
doaj +1 more source
Ultrasoft silicone elastomers often sacrifice surface functionality for mechanical compliance. In Mold Star, low‐molecular‐weight species form a dispersed phase that weakens the network and passivates the surface. Solvent extraction removes this phase, unexpectedly improving both extensibility and metallization performance, enabling conductive ...
Gloria M. D'Amaral +7 more
wiley +1 more source

