Results 61 to 70 of about 1,458,991 (299)

Impact of Ar/CF₄ Mixed Gas Flow Rate on Silicon Etching Using Surface Discharge Plasma

Applied Sciences
This study examines the effects of varying argon (Ar) and carbon tetrafluoride (CF4) gas flow rates on the etching of monocrystalline silicon substrates using surface discharge plasma.
Toshiyuki Hamada, Kazuki Nishida, Masafumi Yoshida   +2 more
doaj   +1 more source

Rapid Microwave Plasma Engineering of HfO2/C@C Core‐Shell Fibrous Membrane Toward Flexible High‐Performance Electromagnetic Wave Absorption

Advanced Functional Materials, EarlyView.
Rapid microwave plasma torch engineering tunes crystal phases, carbon graphitization and oxygen‐vacancy defects in HfO2/C@C core‐shell fibrous membranes. Synergistic multi‐loss effects optimize impedance matching to deliver −65.75 dB reflection loss and a 7.37 GHz effective bandwidth for flexible electromagnetic wave absorption.
Qichao Ding, Limeng Song, Wei Li, Jiangtao Hao, Xuewen Jiang, Mengru Li, Xinglai Yuan, Gang Wang, Yanqiu Zhu, Mi Tian, Hailong Wang, Hongxia Li, Biao Zhao, Rui Zhang, Bingbing Fan   +14 more
wiley   +1 more source

Optimization of inductively coupled plasma dry etching for planar waveguide fabrication / Lim Weng Hong [PDF]

, 2010
Optimization of the Inductively Coupled Plasma (ICP) dry etching process parameters has been carried out. Seven main etching characteristics were considered in order to produce good etching quality.
Lim, Weng Hong
core  

Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma

, 2019
Yttrium oxide (Y2O3) and yttrium oxyfluoride (YO0.6F2.1) protective coatings were prepared by an atmospheric plasma spraying technique. The coatings were exposed to a NF3 plasma.
Jin-Tae Kim, Seong-Geun Oh, Ju-Young Yun, Je-Boem Song   +3 more
core   +1 more source

An Adaptive Inhibitory WSe2 Transistor for Retinomorphic In‐Sensor Image Processing

Advanced Functional Materials, EarlyView.
Conventional retinomorphic devices typically require deliberate gate‐bias tuning for each illumination condition. In this paper, we demonstrate an adaptive inhibitory WSe2 transistor that uses photo‐induced regime shift between the subthreshold and accumulation modes to achieve decision‐free, intensity‐adaptive image processing within a single pixel ...
Juhwan Baek, Junhwa Oh, Hyeonjung Kim, Minsik Park, Haein Cho, Jin Young Park, Hyeonchang Son, Taeyun Kim, Sung‐Un An, Yamin Zhang, Hyeon‐Jin Shin, Seyong Oh, Dong‐Ho Kang   +12 more
wiley   +1 more source

Nitride MXenes Beyond Carbides: Bridging the Gap Between Computational Prediction and Experimental Realization

Advanced Functional Materials, EarlyView.
Nitride MXenes remain constrained by a persistent gap between computational prediction and experimental realization. This Review identifies the thermodynamic, kinetic, and chemical barriers limiting their synthesis, critically evaluates emerging fabrication routes, and proposes a multidimensional computational‐experimental framework to accelerate the ...
Naresh Varnakavi, Masoud Soroush
wiley   +1 more source

Estudo dos mecanismos de interação de plasma de Ar e Ar-O2 com ácido esteárico [PDF]

, 2012
Tese (doutorado) - Universidade Federal de Santa Catarina, Centro Tecnológico, Programa de Pós-Graduação em Ciência e Engenharia de Materiais, Florianópolis, 2011Devido à sensibilidade das técnicas de tratamento superficial quanto à presença de ...
Bernardelli, Euclides Alexandre
core  

Structure‐Property Relationships in Catecholamine Coatings for Broad Surface Functionalization

Advanced Functional Materials, EarlyView.
Inspired by mussel adhesive proteins (MAPs), six catecholamine molecules with different molecular structure were systematically characterized and compared based on their ability to form homogeneous, reactive coatings. Highlighting candidates capable of balancing coating properties of interest, their successful use as primer layers for organic and ...
Caroline F. Harms, Qiming Li, Ye‐Sol Kim, Anish Tuteja, Jinsang Kim, Abdon Pena‐Francesch   +5 more
wiley   +1 more source

Toward reliable morphology assessment of thermosets via physical etching: Vinyl ester resin as an example

eXPRESS Polymer Letters, 2013
The morphology of peroxide-cured, styrene crosslinked, bisphenol A-based vinyl ester (VE) resin was investigated by atomic force microscopy (AFM) after ‘physical’ etching with different methods.
J. Karger-Kocsis, A. Wolynski, B. Wetzel, J. Elsäßer, A. Bonyar, S. Grishchuk   +5 more
doaj   +1 more source

Plasma assisted deposition of thin films using molecular titanium alkoxide and amido precursors [PDF]

, 1995
Metal-containing polymer thin films are known to possess interesting electrical, magnetic, optical or barrier properties. Such coatings can be deposited by plasma assisted chemical vapour deposition (PACVD). This technique comprises the fragmentation and
Ratcliffe, Peter John
core