Results 81 to 90 of about 1,458,991 (299)

Atmospheric-pressure PECVD coating and plasma chemical etching for continuous processing

, 2022
S.204-214Plasma processing at atmospheric pressure (APPlasmas) has attractions for both economic and technological reasons. Potential costs-saving factors are associated with online-processing capability and increase throughput due to high deposition ...
Sheel, D.W., Hopfe, V.
core   +1 more source

Stretchable Microelectrode Arrays for Electro‐Mechanical Probing of Brain Spheroids

Advanced Healthcare Materials, EarlyView.
A multimodal device featuring kirigami‐patterned stretchable microelectrode arrays enables concurrent mechanical actuation and electrophysiological recording of brain spheroids. The platform supports multiple loading regimes and reveals mechanically induced modulation of spontaneous network activity in 3D neural tissue models.
Eleonora Martinelli, Ivan Furfaro, Flavius Timis, João Marques, Tala El Kaissi, Desirée Maulà, Laurine Kolly, Julian Bär, Sina Röllin, Scott Erickson, Laetitia Nikles, Benoît Delaup, Camille Delgrange, Loris Gomez Baisac, Luc Stoppini, Adrien Roux, Giuseppe Schiavone, Stéphanie P. Lacour   +17 more
wiley   +1 more source

Creating anti-reflective nanostructures on polymers by initial layer deposition before plasma etching

, 2022
S.S716-S721The generation of nanostructures by initial layer deposition and plasma etching offers a simple and cost-effective method for imparting broadband anti-reflection properties to polymer optics. in this study, we have investigated the possibility
Munzert, P., Wendling, I., Schulz, U., Tünnermann, A., Kaiser, N.   +4 more
core   +1 more source

Beyond Presumptions: Toward Mechanistic Clarity in Metal‐Free Carbon Catalysts for Electrochemical H2O2 Production via Data Science

Advanced Materials, EarlyView.
Metal‐free carbon catalysts enable the sustainable synthesis of hydrogen peroxide via two‐electron oxygen reduction; however, active site complexity continues to hinder reliable interpretation. This review critiques correlation‐based approaches and highlights the importance of orthogonal experimental designs, standardized catalyst passports ...
Dayu Zhu, Hsi‐wen Wu, Xiao Wang, Jie Zhang   +3 more
wiley   +1 more source

Surface modification and fatigue properties of electrical discharge machined aluminum alloy 6061 using plasma etching

Advances in Mechanical Engineering, 2018
Aluminum (Al) alloy 6061 is often used in engineering applications due to its high strength, excellent fracture toughness, and corrosion resistance. Lots of material removal or machining processes would induce some undesirable side effects like surface ...
Chin-Guo Kuo, Chun-Yao Hsu, Jung-Hsuan Chen, Po-Wei Lee   +3 more
doaj   +1 more source

High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl2/Ar plasma

Materials Research Express, 2020
We investigated the etching characteristics of aluminum-doped zinc oxide (AZO) thin films in an adaptively coupled plasma (ACP) system. The dry etching characteristics of AZO films were studied by changing the Cl _2 /Ar gas mixing ratio, RF power, DC ...
Liting Zhang, Young-Hee Joo, Doo-Seung Um, Chang-Il Kim   +3 more
doaj   +1 more source

Ion‐Reconfigurable “N”‐Shaped Antiambipolar Behavior in Organic Electrochemical Transistors

Advanced Materials, EarlyView.
A unique N‐shaped negative differential transconductance (NDT) characteristics is demonstrated in single‐polymer organic electrochemical transistors through a sequential doping–redox–doping process driven by iodide ions. This redox‐driven mechanism enables low‐voltage, ion‐controlled reconfigurability and tunable current modulation, allowing seamless ...
Debdatta Panigrahi, Daniele Zucchelli, Zeinab Hamid, Christina Kousseff, Arup Sarkar, Aristea Pavlou, Zhitian Ling, Somayeh Kashani, Iain McCulloch, Paul W. M. Blom, Fabrizio Torricelli, Paschalis Gkoupidenis   +11 more
wiley   +1 more source

Diagnostics of etching plasmas [PDF]

Pure and Applied Chemistry, 2002
Abstract Radio-frequency excited, low-pressure plasmas in halogen-containing gases are widely used to etch submicronic features in a range of materials during integrated circuit manufacture. Costly process-drift problems are often caused by the ubiquitous deposition of polymer layers on the reactor walls. Simple and robust sensors of the
openaire   +1 more source

Atmospheric pressure plasmas for surface modification [PDF]

, 2001
Many methods are currently used for the production of silicon oxide films, most have drawbacks associated with high temperatures and the requirement for a vacuum. Atmospheric pressure plasma treatment can address some of these difficulties.
Ward, Luke John
core  

Ultrafast Vertical Organic Electrochemical Transistors With Ion‐Permeable Conductive Polymer Top Electrodes

Advanced Materials, EarlyView.
Vertical organic electrochemical transistors (vOECTs) are limited in speed by ion‐impermeable metal electrodes that slow ion injection. Using ion‐permeable PBFDO top electrodes allows direct vertical ion injection into BBL channels, achieving high current densities (>400 A cm−2), large on/off ratios (>106), and ultrafast switching in 28 µs. This sets a
Han‐Yan Wu, Yingxue An, Luigi Fabiano, Qifan Li, Qingqing Wang, Feng Zhang, Wenlong Jin, Miao Xiong, Junpeng Ji, Ugo Bruno, Grzegorz Greczynski, Grazia Maria Lucia Messina, Xianjie Liu, Chi‐Yuan Yang, Simone Fabiano   +14 more
wiley   +1 more source