Results 111 to 120 of about 27,754 (260)
In the semiconductor manufacturing process, when conducting inductively coupled plasma-reactive ion etching in challenging environments, both wafers and the ceramic components comprising the chamber’s interior can be influenced by plasma attack.
Ho Jin Ma +8 more
doaj +1 more source
Doping density, not valency, influences catalytic metal-assisted plasma etching of silicon.
Sun JB +3 more
europepmc +1 more source
Femtosecond‐Laser Mould Texturing Enables Tunable Biointerfaces in COC Microfluidics
Femtosecond‐laser texturing of injection‐mould inserts enables scalable engineering of biointerfaces in cyclic olefin copolymer microfluidics. Replicated micro‐ and nano‐topographies modulate surface roughness and wettability, leading to texture‐dependent protein adsorption and cell adhesion without chemical post‐processing.
Irene Varela‐Leniz +9 more
wiley +1 more source
The technique of plasma processing is beneficial for wafer cleaning and precision etching of integrated circuits and essential in manufacture of advanced semiconductor devices with unmatched perfection. Research on two‐dimensional (2D) materials, such as
Changmin Kim +5 more
doaj +1 more source
Xenes for Sustainable Energy: A Roadmap From First‐Principles Design to Practical Deployment
Emerging 2D Xenes are advancing from theoretical predictions toward practical energy‐storage and conversion technologies through the integration of first‐principles modelling, experimental synthesis, electrochemical validation, and AI‐assisted materials design, enabling accelerated discovery of high‐performance and sustainable electrochemical systems ...
Onur Karaman, Ceren Karaman
wiley +1 more source
A triple‐cation perovskite detector with a quasi‐interdigitated back‐contact architecture enables highly sensitive and linear EUV/soft x‐ray detection by minimizing electrode shadowing and enhancing charge extraction. Efficient interfacial carrier collection and rapid temporal response highlight the potential of back‐contact‐engineered perovskites for ...
Jingying Liu +5 more
wiley +1 more source
This work presents an innovative spin‐on SiOx‐assisted inkjet‐printed approach to form localized n+ and p+ poly‐Si/SiOx passivating contacts for high‐efficiency silicon solar cells within a single‐annealing step. The developed process results in a well‐defined interdigitated doping pattern, with unintended doping and cross‐doping concentrations ...
Jiali Wang +8 more
wiley +1 more source
Development of Energy-Efficient Superhydrophobic Polypropylene Fabric by Oxygen Plasma Etching and Thermal Aging. [PDF]
Kim S, Oh JH, Park CH.
europepmc +1 more source
This review explores advances in wearable and lab‐on‐chip technologies for breast cancer detection. Covering tactile, thermal, ultrasound, microwave, electrical impedance tomography, electrochemical, microelectromechanical, and optical systems, it highlights innovations in flexible electronics, nanomaterials, and machine learning.
Neshika Wijewardhane +4 more
wiley +1 more source
Impact of Inductively Coupled Plasma Etching Conditions on the Formation of Semi-Polar ( 11 2 ¯ 2 ) and Non-Polar ( 11 2 ¯ 0 ) GaN Nanorods. [PDF]
Coulon PM, Feng P, Wang T, Shields PA.
europepmc +1 more source

