Results 131 to 140 of about 1,458,991 (299)
Radiative Thermal Management for Extreme Environments: Mechanisms and Design Strategies
In this review, we discuss the fundamental mechanisms of radiative cooling and solar heating, material and structural design strategies, hybrid approaches integrating additional heat transfer pathways, and durability‐oriented designs addressing environmental stresses.
Hyung Rae Kim +5 more
wiley +1 more source
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. [PDF]
Choi M +10 more
europepmc +1 more source
Topological insulator–metamaterials integrated with electrically driven terahertz quantum cascade lasers enable parity‐dependent harmonic generation. Bulk‐dominated Bi2Se3 favors third‐harmonic emission at 9.96 THz, whereas topological‐surface‐state‐dominated Bi2Se3, Bi2Te3, and (Bi,Sb)2Te3 generate strong second harmonics near 6.5 THz.
Alessandra Di Gaspare +9 more
wiley +1 more source
Charging in Aspect Ratio Dependent Etching [PDF]
In this work, a novel diagnostic tool was developed in order to provide a measurement technique for sidewall charging in high aspect ratio features exposed to a plasma environment.
Ritz, Eithan
core
Soft and Transient Bioelectronics Enabled by Polymer‐Free Ti3C2Tx MXene Hydrogels
We present Ti3C2Tx MXene hydrogel (MXgel) bioelectronics, a soft, flexible, and fully transient platform for high‐fidelity neural recording and stimulation. MXgel bioelectronics exhibit exceptional electrical conductivities, low electrochemical impedances, and high charge injection capacities.
Raghav Garg +15 more
wiley +1 more source
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo +7 more
wiley +1 more source
Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients. [PDF]
Darvill D +5 more
europepmc +1 more source
Current and future generations of sophisticated compound semiconductor devices require the ability for submicron scale patterning. The situation is being complicated since some of the new devices are based on a wider diversity of materials to be etched ...
Abernathy, C.R.; Hobson, W.S.; Hong, J.; Lambers, E.S.; Pearton, S.J.; Shul, R.J.
core
Amorphous Hydrogenated Carbon Etching with a Low Energetic Plasma Jet [PDF]
Structures in the chip industry are approaching the 32 nm half pitch, which requires radiation in the VUV and EUV range. Cracking of hydrocarbon impurities in the vacuum by the radiation causes C growth on the VUV and EUV optics.
Engeln, RAH Richard +5 more
core +1 more source
Plasmon‐Enhanced Second‐Harmonic Generation in Atomically Thin Crystalline Silver Nanostructures
Atomically thin crystalline silver films combine vertical quantum confinement with lateral plasmonic field enhancement to boost second‐harmonic generation. Nanoribbon and nanotriangle arrays enable geometry‐tunable infrared plasmon resonances, producing strong SHG from deeply subwavelength metallic volumes compatible with silicon‐based nanophotonics ...
Saad Abdullah +10 more
wiley +1 more source

