Results 291 to 300 of about 3,124 (304)

Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions

Microelectronic Engineering, 2006
Nam-Hoon Kim, Yong-Jin Seo, Woo-Sun Lee   +2 more
exaly  

A polishing process for nonlinear optical crystal flats based on an annular polyurethane pad

Applied Surface Science, 2012
Defeng Liao, Ruiqing Xie, Xianhua Chen   +2 more
exaly  

Polishing pad surface characterisation in chemical mechanical planarisation

Journal of Materials Processing Technology, 2004
exaly  

Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process

Wear, 2017
Seokjun Hong, Cheolmin Shin, Taesung Kim   +2 more
exaly  

Effects of particle size, polishing pad and contact pressure in free abrasive polishing

Wear, 1996
exaly  

Effect of pad wear on tool influence function in robotic polishing of large optics

International Journal of Advanced Manufacturing Technology, 2019
Songlin Wan, Xiangchao Zhang
exaly  

A new nonlinear-micro-contact model for single particle in the chemical–mechanical polishing with soft pad

Journal of Materials Processing Technology, 2007
Yongguang Wang
exaly  

Modelling of polyurethane polishing pad surface topography and fixed-point polished surface profile

Tribology International
Zixuan Wang, Yingdong Liang, Zhijie Cui   +2 more
exaly  

Investigation of a Novel Diamond Disk's Effect on Pad Topography in Oxide Chemical Mechanical Polishing

Materials and Manufacturing Processes, 2010
Ming-Yi Tsai
exaly  

Dependence of pad performance on its texture in polishing mono-crystalline silicon wafers

International Journal of Mechanical Sciences, 2010
exaly