Results 281 to 290 of about 3,124 (304)
Some of the next articles are maybe not open access.
Novel diamond conditioner dressing characteristics of CMP polishing pad
International Journal of Machine Tools and Manufacture, 2009Ming-Yi Tsai +2 more
exaly
Evaluation of the wafer polishing pad capacity and lifetime in the machining of reliable elevations
International Journal of Machine Tools and Manufacture, 2013Seong-Hyun Kim
exaly
Self-conditioning of encapsulated abrasive pad in chemical mechanical polishing
Journal of Materials Processing Technology, 2003Haedo Jeong
exaly
Characteristics of chemical mechanical polishing using graphite impregnated pad
International Journal of Machine Tools and Manufacture, 2010Ming-Yi Tsai
exaly
Polishing Characteristics of Hydrophilic Pad in Chemical Mechanical Polishing Process
Materials and Manufacturing Processes, 2012Ming-Yi Tsai
exaly
Wear of Vesicant Polyurethane Pad by Polishing
The Proceedings of The Manufacturing & Machine Tool Conference, 2000Toshiji KUROBE +2 more
openaire +1 more source
A study on polishing of molds using hydrophilic fixed abrasive pad
International Journal of Machine Tools and Manufacture, 2004Haedo Jeong
exaly

