Results 281 to 290 of about 3,124 (304)
Some of the next articles are maybe not open access.

Novel diamond conditioner dressing characteristics of CMP polishing pad

International Journal of Machine Tools and Manufacture, 2009
Ming-Yi Tsai   +2 more
exaly  

New optical polishing pad

Journal of the Franklin Institute, 1963
openaire   +1 more source

Evaluation of the wafer polishing pad capacity and lifetime in the machining of reliable elevations

International Journal of Machine Tools and Manufacture, 2013
Seong-Hyun Kim
exaly  

Self-conditioning of encapsulated abrasive pad in chemical mechanical polishing

Journal of Materials Processing Technology, 2003
Haedo Jeong
exaly  

Modeling and analysis of the material removal profile for free abrasive polishing with sub-aperture pad

Journal of Materials Processing Technology, 2014
Ji Zhao, Yoke San Wong, Geok Soon Hong
exaly  

Characteristics of chemical mechanical polishing using graphite impregnated pad

International Journal of Machine Tools and Manufacture, 2010
Ming-Yi Tsai
exaly  

Polishing Characteristics of Hydrophilic Pad in Chemical Mechanical Polishing Process

Materials and Manufacturing Processes, 2012
Ming-Yi Tsai
exaly  

Wear of Vesicant Polyurethane Pad by Polishing

The Proceedings of The Manufacturing & Machine Tool Conference, 2000
Toshiji KUROBE   +2 more
openaire   +1 more source

A study on polishing of molds using hydrophilic fixed abrasive pad

International Journal of Machine Tools and Manufacture, 2004
Haedo Jeong
exaly  

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